METHODS AND APPARATUS FOR CURING PIXEL MATRIX FILTER MATERIALS
First Claim
1. A method of processing a substrate, the method comprising:
- applying a first activation energy to a patterned pixel matrix material on a substrate sufficient to cause the patterned pixel matrix material to attain a first state, wherein the patterned pixel matrix material in the first state includes a minimized change in volume relative to a volume of the patterned pixel matrix material prior to application of the first activation energy and an increased hardness sufficient to withstand inkjetting;
inkjetting a color material onto the substrate; and
applying an additional activation energy to the patterned pixel matrix material sufficient to attain a second state, wherein the patterned pixel matrix material in the second state includes a reduction in the volume of the patterned pixel matrix material and is substantially hardened.
1 Assignment
0 Petitions
Accused Products
Abstract
In the formation of color filters for flat panel displays, the invention includes concurrently curing and shrinking a pixel matrix and a color material on a substrate to achieve a substantially co-planar top surface. The invention includes applying a first activation energy to a pixel matrix material to render the material partially cured, minimally shrunk, hardened, and chemically ready for the application of a color material; applying the color material; and concurrently shrinking the color material and pixel material by the application of at least an additional activation energy wherein the additional activation energy is greater than the first activation energy. Numerous other aspects are provided.
-
Citations
25 Claims
-
1. A method of processing a substrate, the method comprising:
-
applying a first activation energy to a patterned pixel matrix material on a substrate sufficient to cause the patterned pixel matrix material to attain a first state, wherein the patterned pixel matrix material in the first state includes a minimized change in volume relative to a volume of the patterned pixel matrix material prior to application of the first activation energy and an increased hardness sufficient to withstand inkjetting; inkjetting a color material onto the substrate; and applying an additional activation energy to the patterned pixel matrix material sufficient to attain a second state, wherein the patterned pixel matrix material in the second state includes a reduction in the volume of the patterned pixel matrix material and is substantially hardened. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
-
-
18. A method of processing a substrate, the method comprising:
-
applying a first activation energy to a patterned pixel matrix material on a substrate sufficient to cause the patterned pixel matrix material to attain a first state, wherein the patterned pixel matrix material in the first state is adapted to withstand inkjetting; inkjetting a color material onto the substrate; and applying an additional activation energy to the patterned pixel matrix material sufficient to attain a second state, wherein concurrent shrinking of the patterned pixel matrix material and the color material results in a top surface of the patterned pixel matrix material and a top surface of the color material being approximately co-planar.
-
-
19. An apparatus comprising:
-
a substrate; a patterned pixel matrix material with a top surface, the patterned pixel matrix material formed on the substrate; and a color material with a top surface, the color material deposited into the patterned pixel matrix material, wherein the patterned pixel matrix material and the color material are cured such that concurrent shrinking of the patterned pixel matrix material and the color material results in the top surface of the patterned pixel matrix material and the top surface of the color material being approximately co-planar. - View Dependent Claims (20, 21, 22, 23)
-
-
24. An apparatus comprising:
-
a patterned pixel matrix material with a top surface; and a color material with a top surface, wherein the top surface of the patterned pixel matrix material and the top surface of the color material are approximately co-planar, wherein a first activation energy is applied to the patterned pixel matrix prior to an application of the color material, wherein an additional activation energy is applied concurrently to the patterned pixel matrix material and the color material, wherein the first application energy is less than the additional activation energy.
-
-
25. A system comprising:
-
a first substrate with a transistor array; a second substrate having a patterned pixel matrix material with at least one top surface and a color material with at least one top surface wherein the at least one top surface of the patterned pixel matrix material and the at least one top surface of the color material are approximately co-planar; a sealant for assembling the first substrate and the second substrate; a spacer separating the first substrate and the second substrate; a liquid crystal material between the first substrate and the second substrate; and one or more polarizers adhered to the outside of the first substrate and the second substrate.
-
Specification