METHOD OF MAKING AN IMPROVED SELECTIVE EMITTER FOR SILICON SOLAR CELLS

• US 20090142875A1
• Filed: 11/30/2007
• Published: 06/04/2009
• Est. Priority Date: 11/30/2007
• Status: Abandoned Application

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Taylor, Mitchell C., Borden, Peter
• Application Number:
  US11/948,630
• Publication Number:
  US 20090142875A1
• Time in Patent Office: Days
• US Class Current: 438/69
• CPC Class Codes: H01L 31/022425 for solar cells
• CPC Class Codes: H01L 31/18 Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
• CPC Class Codes: Y02E 10/50 Photovoltaic [PV] energy

Abstract

A method for forming a selective emitter on a silicon solar cell is provided including forming an oxide layer on a surface of the P-type silicon substrate, implanting phosphorus doping atoms into the oxide layer on the substrate using plasma immersion ion implantation, patterning the oxide layer, annealing the substrate to provide heavily doped regions in the patterned regions and a lightly doped region between the patterned regions, and providing metal contacts to the heavily doped regions.

Claims

1. A method of selectively doping predetermined regions of a surface of a crystalline silicon body comprising:

forming a passivation layer on the surface, wherein the passivation layer comprises a dielectric material and a first amount of a doping atom;

patterning the passivation layer to define apertures therein;

plasma implanting a second amount of a doping atom into the patterned structure passivation layer; and

annealing the body.

3. The method of claim 1, wherein the passivation layer is patterned using laser ablation.

4. The method of claim 1, wherein the passivation layer is patterned using a mask and etching.

5. The method of claim 1, whereby, upon annealing, at least two (2) actively-doped regions are formed in the body with at least a portion of the doping atoms from at least one of the regions entering the body through out-diffusion from the patterned passivation layer.

6. The method of claim 1, in which the plasma-implanted second doping atoms include phosphorus.

7. The method of claim 1, in which the plasma-implanted second doping atoms include boron.

8. The method of claim 1, in which the plasma-implanted second doping atoms include arsenic.

22. The method of claim 1, wherein the passivation layer is annealed prior to patterning.

25. The method of claim 1, wherein the first amount of the doping atoms in the patterned passivation layer is substantially less than the second amount of the doping atoms deposited through the apertures.

2. (canceled)

9. A method for forming a selective emitter on a silicon solar cell including a substrate, the method comprising:

positioning a physical mask having a plurality of apertures formed at a first position over a surface of the substrate;

introducing a doping gas adjacent to the surface;

generating a plasma in the doping gas for plasma implanting doping ions of a first conductivity type through the plurality of apertures into regions of the substrate disposed below the plurality of apertures until a first dopant dose is reached; and

annealing the substrate with the doping ions disposed therein.

14. The method of claim 9, further comprising generating a plasma over the surface of the substrate, without the physical mask being positioned over the surface, and plasma implanting a doping ion into regions of the substrate until a second dopant dose is reached.

15. The method of claim 14, in which the first dopant dose and second dopant dose are different.

26. The method of claim 9, further comprising repositioning the physical mask to a second position above the surface of the substrate different from the first position, introducing a doping gas adjacent the surface, and generating a plasma in the doping gas for plasma implanting a second doping atom of a second conductivity type opposite to the first conductivity type through the apertures and into the substrate.

10-13. -13. (canceled)

16. A method for forming a selective emitter on a silicon solar cell including a substrate, the method comprising:

forming a dielectric layer over a surface of the substrate, wherein the dielectric layer includes a first amount of a doping atom therein;

providing an antireflective layer over the dielectric layer;

forming apertures through the antireflective layer and the dielectric layer;

introducing a doping gas adjacent the surface;

generating a plasma in the doping gas for plasma implanting doping ions through the apertures and into the substrate; and

annealing the substrate with the doping ions disposed therein.

18. The method of claim 16, wherein the doping atoms in the dielectric layer have a first dose and the doping ions delivered into the substrate through the apertures have a second dose, the second dose being substantially greater than the first dose.

19. The method of claim 18, wherein the antireflective coating is silicon nitride.

20. The method of claim 18, wherein the apertures are formed by laser ablation.

21. The method of claim 20, wherein the dielectric layer, the laser ablation and the plasma doping are all formed within the same system.

17. (canceled)

23. A method for forming a selective emitter on a silicon solar cell including a substrate, the method comprising:

forming a dielectric layer over a surface of the substrate, wherein the dielectric layer comprises a doping ion;

forming apertures in the dielectric layer;

introducing a doping gas adjacent to the surface;

generating a plasma in the doping gas to implant an amount of a doping ion through the apertures into regions of the substrate; and

annealing the substrate with the doping ions disposed therein.

24. The method of claim 23, wherein the doping ions in the dielectric layer have a first dose and the doping ions deposited through the apertures have a second dose, the second dose being substantially greater than the first dose.