MICROELECTRONIC IMAGING UNITS HAVING AN INFRARED-ABSORBING LAYER AND ASSOCIATED SYSTEMS AND METHODS
First Claim
1. A method of manufacturing a microelectronic imaging unit, the method comprising:
- attaching an infrared-absorbing lamina to a backside die surface of an imager workpiece having at least one imaging die, the infrared-absorbing lamina including an infrared-absorbing material that absorbs electromagnetic radiation in the near-infrared frequency spectra;
singulating from the imager workpiece the imaging die and a section of the infrared-absorbing lamina attached to the imaging die; and
coupling the backside die surface to an interposer substrate, wherein at least a portion of the infrared-absorbing lamina is positioned between the interposer substrate and the imaging die.
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0 Petitions
Accused Products
Abstract
Infrared (IR) absorbing layers and microelectronic imaging units that employ such layers are disclosed herein. In one embodiment, a method of manufacturing a microelectronic imaging unit includes attaching an IR-absorbing lamina having a filler material to a backside die surface of an imager workpiece. An individual imaging die is singulated from the workpiece such that a section of the infrared-absorbing lamina remains attached to the individual imaging die. The individual imaging die is coupled to an interposer substrate with a portion of the IR-absorbing lamina positioned therebetween. In another embodiment, the IR-absorbing lamina is a die attach film and the filler material is carbon black.
56 Citations
25 Claims
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1. A method of manufacturing a microelectronic imaging unit, the method comprising:
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attaching an infrared-absorbing lamina to a backside die surface of an imager workpiece having at least one imaging die, the infrared-absorbing lamina including an infrared-absorbing material that absorbs electromagnetic radiation in the near-infrared frequency spectra; singulating from the imager workpiece the imaging die and a section of the infrared-absorbing lamina attached to the imaging die; and coupling the backside die surface to an interposer substrate, wherein at least a portion of the infrared-absorbing lamina is positioned between the interposer substrate and the imaging die. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method for manufacturing a microelectronic imaging unit, the method comprising:
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aligning a lamina comprising a pre-formed polymeric film and an infrared-absorbing material with an imaging die; covering a backside surface of the imaging die with the pre-formed polymeric film; and attaching an interposer substrate to at least a portion of the pre-formed polymeric film at the backside surface of the imaging die. - View Dependent Claims (9, 10)
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11. The method of claim 11 wherein coupling the electrical contacts of the imaging die is carried out by at least one of a wire bonding process and a bump bonding process.
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12. A method for inhibiting the transmission of electromagnetic radiation between an interposer substrate and a microelectronic die, the method comprising:
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coupling a microelectronic die to an interposer substrate; and positioning an infrared-absorbing lamina between the microelectronic die and the interposer substrate carrying the microelectronic die, the infrared-absorbing lamina including a material that absorbs infrared light, and the interposer substrate including a region adjacent to the infrared-absorbing lamina that is generally transparent to the infrared light. - View Dependent Claims (13, 14, 15)
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16. A microelectronic imaging unit, comprising:
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a microelectronic imaging die including a backside die surface; an infrared-absorbing lamina attached to at least a portion of the backside die surface, the infrared-absorbing lamina including a material that filters out infrared radiation; and an interposer substrate coupled to the imaging die, wherein the infrared-absorbing lamina is between the backside die surface and the interposer substrate. - View Dependent Claims (17, 18, 19, 20)
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21. An infrared imaging system, comprising:
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a support substrate; a microelectronic imaging unit electrically coupled to the support substrate and including an imaging die having an image sensor; at least one infrared light-emitting diode coupled to the support substrate and configured to output infrared light; and a radiation-absorbing element between the backside surface of the imaging die and the support substrate, wherein the radiation absorbing element is not transmissive to infrared radiation. - View Dependent Claims (22, 23, 24, 25)
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Specification