Exposure apparatus, manufacturing method thereof, and maintenance method of exposure apparatus

• US 20090147228A1
• Filed: 12/10/2008
• Published: 06/11/2009
• Est. Priority Date: 12/11/2007
• Status: Abandoned Application

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Shimoda, Toshimasa, Arai, Yoichi, Ono, Kazuya
• Application Number:
  US12/314,411
• Publication Number:
  US 20090147228A1
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70808 Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
• CPC Class Codes: G03F 7/70975 Assembly, maintenance, transport or storage of apparatus

Abstract

A projection optical system PL is used to project an image of a pattern. A manufacturing method of an exposure apparatus includes: a positioning step of positioning the projection optical system at a predetermined position; and a support step of supporting the positioned projection optical system. The positioning step includes a step of moving the projection optical system upward from below at the time of positioning.

Claims

1. A manufacturing method of an exposure apparatus that uses a projection optical system to project an image of a pattern, the method comprising:

upwardly moving the projection optical system to position the projection optical system at a predetermined position; and

supporting the positioned projection optical system.

2. The manufacturing method of the exposure apparatus according to claim 1, wherein the positioning comprises supporting the projection optical system from below.

3. The manufacturing method of the exposure apparatus according to claim 2, wherein the positioning further comprises providing a lifting apparatus that freely travels in a horizontal direction and that supports the projection optical system from below.

4. The manufacturing method of the exposure apparatus according to claim 1, wherein the supporting comprises providing a support member that has a flexible structure and by which the projection optical system is suspended and supported.

5. The manufacturing method of the exposure apparatus according to claim 1, wherein

the exposure apparatus comprises:

a substrate stage that moves while holding a substrate onto which the image of the pattern is projected; and

a support structure provided with an accommodation portion that supports the projection optical system and accommodates the substrate stage, and

in the positioning, the projection optical system is moved upward via the accommodation portion.

6. The manufacturing method of the exposure apparatus according to claim 5, wherein the positioning further comprises:

taking out the substrate stage from the accommodation portion before the projection optical system is moved upward via the accommodation portion; and

accommodating the substrate stage in the accommodation portion after the projection optical system is positioned.

7. The manufacturing method of the exposure apparatus according to claim 6, wherein the substrate stage is taken out from and accommodated in the accommodation portion in a state in which the substrate stage is in united state with an environment control apparatus that controls an environment around the substrate stage.

8. The manufacturing method of the exposure apparatus according to claim 5, wherein

the projection optical system is driven by a driving apparatus that generates a driving force through cooperation between a first member and a second member, one of the first member and the second member being provided in the projection optical system, the other of the first member and the second member being supported, at a position facing the one member, by a movable member capable of moving with respect to the support structure, and

the method further comprises facing the first member with the second member by setting the movable member and the support structure in a predetermined positional relationship.

9. A maintenance method of an exposure apparatus that uses a projection optical system to project an image of a pattern, the method comprising

uninstalling the projection optical system from the exposure apparatus, the un-installation comprising downwardly moving the projection optical system supported by a support member.

10. The maintenance method of the exposure apparatus according to claim 9, wherein the un-installation farther comprises supporting the projection optical system from below.

11. The maintenance method of the exposure apparatus according to claim 10, wherein the un-installation further comprises providing a lifting apparatus that freely travels in a horizontal direction and that support the projection optical system from below.

12. The maintenance method of the exposure apparatus according to claim 9, wherein the projection optical system is suspended by a support member with a flexible structure so as to be positioned at a predetermined position.

13. The maintenance method of the exposure apparatus according to claim 9, wherein

the exposure apparatus comprises:

a substrate stage that moves while holding a substrate onto which the image of the pattern is projected; and

a support structure provided with an accommodation portion that supports the projection optical system via the support member and accommodates the substrate stage, and

the downwardly moving comprises moving the projection optical system in the accommodation portion.

14. The maintenance method of the exposure apparatus according to claim 13, wherein the un-installation further comprises:

taking out the substrate stage from the accommodation portion before the projection optical system is moved to the accommodation portion; and

horizontally moving the projection optical system at the accommodation portion.

15. The maintenance method of the exposure apparatus according to claim 14, wherein the substrate stage is carried in and out from the accommodation portion in a state in which the substrate stage is in united state with an environment control apparatus that controls an environment around the substrate stage.

16. The maintenance method of the exposure apparatus according to claim 13, wherein

the projection optical system is driven by a driving apparatus that generates a driving force through cooperation between a first member and a second member, one of the first member and the second member being provided in the projection optical system, the other of the first member and the second member being supported, at a position facing the one member, by a movable member capable of moving with respect to the support structure, and

the horizontal movement comprises forming an opening portion via which the projection optical system is horizontal moved with the movable member and the support structure being set in a predetermined positional relationship.

17. An exposure apparatus that uses a projection optical system to project an image of a pattern, comprising:

a support structure that supports a projection optical system; and

an opening portion via which the projection optical system is carried out in a horizontal direction, the opening portion being located lower than the projection optical system supported by the support structure.

18. The exposure apparatus according to claim 17, further comprising:

a mask holding apparatus that holds a mask with a surface on which the pattern is formed; and

a substrate holding apparatus that holds a substrate onto which the image of the pattern is projected,

wherein a distance in a height direction between the surface on which the pattern of the mask held in the mask holding apparatus is formed and a surface of the substrate held in the substrate holding apparatus is smaller than a distance in a height direction between the surface of the substrate and a floor portion.

19. The exposure apparatus according to claim 17, wherein a width in a height direction of the opening portion is larger than a length in a height direction of the projection optical system.

20. The exposure apparatus according to claim 19, wherein the length in a height direction of the projection optical system is smaller than a distance in a height direction between the surface of the substrate and the floor portion.

21. The exposure apparatus according to claim 17, wherein the support structure suspends and supports the projection optical system by means of a support member with a flexible structure.

22. The exposure apparatus according to claim 20, wherein the substrate holding apparatus can be freely moved in and out from the support structure via the opening portion.

23. The exposure apparatus according to claim 22, wherein the substrate holding apparatus is freely moved in and out from the support structure in a state in which the substrate holding apparatus is in united state with an environment control apparatus that controls an environment around the substrate holding apparatus.

24. The exposure apparatus according to claim 17, further comprising:

a driving apparatus that drives the projection optical system; and

a movable member capable of moving with respect to the support structure,

wherein the driving apparatus comprises a first member and a second member that cooperate to generate a driving force, one of the first member and the second member being provided in the projection optical system, the other of the first member and the second member being supported, at a position facing the one member, by the movable member.