Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses
First Claim
1. An apparatus which illuminates a surface to be illuminated with radiation from a radiation source, the apparatus comprising:
- a polarization state converter arranged in an illumination path;
a first crystal optical element having a first thickness along an optical axis direction; and
a second crystal optical element having a second thickness along an optical axis direction;
wherein the first and second crystal optical elements are arranged in a plane disposed in an illumination path of the apparatus.
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Abstract
A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical material with optical activity, for forming a first region distribution of the predetermined light intensity distribution on the basis of the incident beam; and a second basic element made of an optical material with optical activity, for forming a second region distribution of the predetermined light intensity distribution on the basis of the incident beam, wherein the first basic element and the second basic element have their respective thicknesses different from each other along a direction of transmission of light.
148 Citations
33 Claims
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1. An apparatus which illuminates a surface to be illuminated with radiation from a radiation source, the apparatus comprising:
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a polarization state converter arranged in an illumination path; a first crystal optical element having a first thickness along an optical axis direction; and a second crystal optical element having a second thickness along an optical axis direction; wherein the first and second crystal optical elements are arranged in a plane disposed in an illumination path of the apparatus. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
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24. An exposure method comprising:
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supplying radiation; passing the supplied radiation through a polarization state converter, passing the radiation from the polarization state converter through a first crystal optical element having a first thickness along a traveling direction of an incident radiation, passing the radiation from the polarization state converter through a second crystal optical element having a second thickness along the traveling direction of an incident radiation, the first and second thicknesses being different from each other, the first and second crystal optical elements arranged in a plane crossing the traveling direction; and projecting an image of a pattern illuminated with the radiation passed through the first and second crystal optical elements, onto a photosensitive substrate. - View Dependent Claims (25, 26, 27, 28, 29, 30, 31, 32, 33)
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Specification