METHOD, PROGRAM PRODUCT AND APPARATUS FOR MODEL BASED GEOMETRY DECOMPOSITION FOR USE IN A MULTIPLE EXPOSURE PROCESS

• US 20090148783A1
• Filed: 12/19/2008
• Published: 06/11/2009
• Est. Priority Date: 12/29/2005
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: Robert John Socha
• Inventors: SOCHA, Robert John
• Granted Patent: US 8,060,842 B2
• Time in Patent Office: Days
• US Class Current: 430/5
• CPC Class Codes: G03F 1/36 Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
• CPC Class Codes: G03F 1/70 Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
• CPC Class Codes: G03F 7/70433 Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
• CPC Class Codes: G03F 7/70466 Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature stitching G03F7/70475
• CPC Class Codes: G03F 7/705 Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions

Abstract

A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process. The method includes the steps of: (a) segmenting a plurality of the features into a plurality of polygons; (b) determining the image log slope (ILS) value for each of the plurality of polygons; (c) determining the polygon having the minimum ILS value, and defining a mask containing the polygon; (d) convolving the mask defined in step (c) with an eigen function of a transmission cross coefficient so as to generate an interference map, where the transmission cross coefficient defines the illumination system to be utilized to image the target pattern; and (e) assigning a phase to the polygon based on the value of the interference map at a location corresponding to the polygon, where the phase defines which exposure in said multiexposure process the polygon is assigned.

Claims

1. A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process, said method comprising the steps of:

(a) segmenting a plurality of said features into a plurality of polygons; and

(b) assigning a phase or color to said polygons based on the value of an interference map at a location respectively corresponding to said polygons, said phase or color defining which exposure in said multi-exposure process said polygons are assigned.

2. The method of claim 1, wherein said interference map is generated by convolving a mask representing said polygons with an eigen function of a transmission cross coefficient, said transmission cross coefficient defining an illumination system.

4. A mask formed utilizing the method of claim 1.

3. A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process, said method comprising the steps of:

(a) segmenting a plurality of said features into a plurality of polygons; and

(b) assigning a phase or color to said polygons based on the result of a convolution of a mask representing said polygons with an eigen function of a transmission cross coefficient, said transmission cross coefficient defining an illumination system.

5. A mask formed utilizing the method of claim 3.

6. A method of imaging a wafer comprising the steps of:

(a) segmenting a plurality of features to be imaged into a plurality of polygons; and

(b) assigning a phase or color to said polygons based on the value of an interference map at a location respectively corresponding to said polygons, said phase or color defining which exposure in a multi-exposure process said polygons are assigned.

7. The method of claim 6, wherein said interference map is generated by convolving a mask representing said polygons with an eigen function of a transmission cross coefficient, said transmission cross coefficient defining an illumination system.

8. A method of imaging a wafer comprising the steps of:

(a) segmenting a plurality of features to be imaged into a plurality of polygons; and

(b) assigning a phase or color to said polygons based on the result of a convolution of a mask representing said polygons with an eigen function of a transmission cross coefficient, said transmission cross coefficient defining an illumination system.

9. A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to decompose a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process, the process comprising the steps of:

(a) segmenting a plurality of said features into a plurality of polygons; and

(b) assigning a phase or color to said polygons based on the value of an interference map at a location respectively corresponding to said polygons, said phase or color defining which exposure in said multi-exposure process said polygons are assigned.

10. The computer program product of claim 9, wherein said interference map is generated by convolving a mask representing said polygons with an eigen function of a transmission cross coefficient, said transmission cross coefficient defining an illumination system.

11. A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to decompose a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process, the process comprising the steps of:

(a) segmenting a plurality of said features into a plurality of polygons; and

(b) assigning a phase or color to said polygons based on the result of a convolution of a mask representing said polygons with an eigen function of a transmission cross coefficient, said transmission cross coefficient defining an illumination system.