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METHOD, PROGRAM PRODUCT AND APPARATUS FOR MODEL BASED GEOMETRY DECOMPOSITION FOR USE IN A MULTIPLE EXPOSURE PROCESS

  • US 20090148783A1
  • Filed: 12/19/2008
  • Published: 06/11/2009
  • Est. Priority Date: 12/29/2005
  • Status: Active Grant
First Claim
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1. A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process, said method comprising the steps of:

  • (a) segmenting a plurality of said features into a plurality of polygons; and

    (b) assigning a phase or color to said polygons based on the value of an interference map at a location respectively corresponding to said polygons, said phase or color defining which exposure in said multi-exposure process said polygons are assigned.

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