Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution

• US 20090159002A1
• Filed: 12/19/2007
• Published: 06/25/2009
• Est. Priority Date: 12/19/2007
• Status: Abandoned Application

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Bera, Kallol, Rauf, Shahid
• Application Number:
  US12/004,448
• Publication Number:
  US 20090159002A1
• Time in Patent Office: Days
• US Class Current: 118/715
• CPC Class Codes: C23C 16/45585 Compression of gas before it reaches the substrate
• CPC Class Codes: H01J 37/3244 Gas supply means

Abstract

A gas distribution plate for a plasma reactor has an annular gas distribution plenum with an array of gas injection holes and a gas injection port at one end of the annular plenum, the plenum being progressively constricted in cross-sectional area along its azimuthal path by a sloping ceiling.

Claims

1. A gas distribution plate comprising:

a disk-shaped plate;

a first hollow annular plenum within or supported by said disk-shaped plate, said annular plenum being concentric with an axis of symmetry of said disk-shaped plate, said plenum comprising an annular floor and an annular ceiling facing said annular floor;

plural gas injection holes in said floor;

a gas injection port coupled to said plenum at a supply end of said plenum; and

said annular ceiling having a height above said annular floor, said height being maximum at said supply end of said plenum, said ceiling sloping toward said floor along an azimuthal path of said plenum whereby said height decreases along said azimuthal path.

2. The apparatus of claim 1 wherein said ceiling slopes sufficiently so that said height decreases by a factor of two or more over 360 degrees of travel along said azimuthal path.

3. The apparatus of claim 1 wherein said ceiling slopes sufficiently so that said height decreases by a factor of two or more over 180 degrees of travel along said azimuthal path.

4. The apparatus of claim 1 wherein said slope is sufficient to maintain uniform gas pressure along said azimuthal path of said plenum.

5. The apparatus of claim 1 wherein said azimuthal path makes a 360 degree circuit, said plenum further comprising a barrier blocking said azimuthal path and having one surface facing a beginning of said azimuthal path and an opposite surface defining an end of said azimuthal path, said beginning of said azimuthal path coinciding with said supply end of said plenum.

6. The apparatus of claim 1 wherein said ceiling slopes from a maximum height at said supply end to a minimum height at a terminal location displaced by 180 degrees of travel along said azimuthal path from said supply end.

7. The apparatus of claim 6 wherein said plenum provides two opposing 180 degree azimuthal paths from said supply end to said terminal end.

8. The apparatus of claim 1 wherein said plenum further comprises a barrier blocking said azimuthal path at a location displaced from said supply end of said plenum by 180 degrees of travel along said azimuthal path.

9. The apparatus of claim 8 wherein said ceiling slopes toward said floor beginning at a maximum height at said supply end and ending at a minimum height at said barrier.

10. The apparatus of claim 9 wherein said barrier divides said azimuthal path into two azimuthal 180 degree paths, said ceiling sloping equally along both of said 180 degree paths.

11. The apparatus of claim 7 wherein said gas supply port feeds both of said two opposing azimuthal paths.

12. The apparatus of claim 8 further comprising a divider separating said supply end into a pair of supply ends and said gas supply port comprises first and second ports coupled separately to said pair of supply ends.

13. The apparatus of claim 1 further comprising a second hollow annular plenum concentric with and surrounding said first hollow annular plenum, said second annular plenum comprising a second annular floor, a second annular ceiling facing said second annular floor and plural gas injection holes in said floor and a second gas injection port coupled to said second plenum at a supply end of said second plenum.

14. The apparatus of claim 13 wherein:

said second annular ceiling has a height above said second annular floor, said height being maximum at said supply end of said second plenum, said second ceiling sloping toward said second floor along an azimuthal path of said second plenum whereby said height decreases along said azimuthal path of said second plenum.

15. The apparatus of claim 13 wherein said second ceiling slopes sufficiently so that said height decreases by a factor of two or more over 360 degrees of travel along said azimuthal path of said second plenum.

16. The apparatus of claim 13 wherein said second ceiling slopes sufficiently so that said height decreases by a factor of two or more over 180 degrees of travel along said azimuthal path of said second plenum.

17. The apparatus of claim 13 wherein said slope of said second ceiling is sufficient to maintain uniform gas pressure along said azimuthal path of said second plenum.

18. The apparatus of claim 13 wherein said first second ceilings slope in the same azimuthal direction.

19. The apparatus of claim 13 wherein said first and second ceiling slope in opposing azimuthal directions.

20. A gas distribution plate comprising:

a disk-shaped plate;

a hollow annular plenum within or supported by said disk-shaped plate, said annular plenum being concentric with an axis of symmetry of said disk-shaped plate, said plenum comprising an annular floor and an annular ceiling facing said annular floor;

plural gas injection holes in said floor;

plural gas injection ports coupled to said plenum, said injection ports being spaced from one another along an azimuthal path of said plenum; and

said annular ceiling having respective peaks of maximum heights above said annular floor at respective ones of said injection ports and having nulls of minimum heights above said annular floor at respective midpoints along said azimuthal path between respective pairs of said injection ports, said ceiling having respective slopes from each peak toward respective ones of said nulls.

21. A plasma reactor chamber comprising:

a vacuum chamber;

a support placed inside the vacuum chamber to hold a substrate;

a gas distribution plate configured to allow an injection of a gas into the chamber, wherein the gas distribution plate further comprises

a first hollow annular plenum within or supported by said plate, said annular plenum being concentric with an axis of symmetry of said plate, said plenum comprising an annular floor and an annular ceiling facing said annular floor;

plural gas injection holes in said floor;

a gas injection port coupled to said plenum at a supply end of said plenum; and

said annular ceiling having a height above said annular floor, said height being maximum at said supply end of said plenum, said ceiling sloping toward said floor along an azimuthal path of said plenum whereby said height decreases along said azimuthal path.

22. A plasma reactor chamber comprising:

a vacuum chamber;

a support placed inside the vacuum chamber to hold a substrate;

a gas distribution plate configured to allow an injection of a gas into the chamber, wherein the gas distribution plate further comprises

a disk-shaped plate;

a hollow annular plenum within or supported by said disk-shaped plate, said annular plenum being concentric with an axis of symmetry of said disk-shaped plate, said plenum comprising an annular floor and an annular ceiling facing said annular floor;

plural gas injection holes in said floor;

plural gas injection ports coupled to said plenum, said injection ports being spaced from one another along an azimuthal path of said plenum; and

said annular ceiling having respective peaks of maximum heights above said annular floor at respective ones of said injection ports and having nulls of minimum heights above said annular floor at respective midpoints along said azimuthal path between respective pairs of said injection ports, said ceiling having respective slopes from each peak toward respective ones of said nulls.