Systems and Methods for Lithographic Illuminator Beam Deviation Measurement and Calibration Using Grating Sensors

• US 20090161093A1
• Filed: 12/22/2008
• Published: 06/25/2009
• Est. Priority Date: 12/21/2007
• Status: Active Grant

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: DOWNEY, Todd R.
• Granted Patent: US 7,821,625 B2
• Time in Patent Office: Days
• US Class Current: 356/139.50
• CPC Class Codes: G01B 11/26 for measuring angles or tapers; for testing the alignment of axes
• CPC Class Codes: G03F 7/70058 Mask illumination systems
• CPC Class Codes: G03F 7/70141 Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system

Abstract

Angular deviation of illumination beam is measured with high accuracy for an expanded continuous range of angles using grating sensors that are configured to exhibit Surface Plasmon Resonance effects at actinic wavelengths. The beam deviation measurement systems and procedures are applicable to both mask-based and maskless lithography tools. A control system adopts an appropriate calibration algorithm based on whether the SPR effect is detected or not. Relative intensity shift in an SPR-affected diffractive order, and/or relative position and slope change in non-SPR-affected diffractive orders are used as a basis of the adopted calibration algorithm.

Claims

1. A system for measuring angular deviations of a beam of radiation with respect to a nominal position, comprising:

an illumination system configured to produce the beam of radiation;

an optical system including an aperture through which at least a portion of the beam of radiation passes to produce an incident beam directed towards a grating sensor, wherein the grating sensor is configured to produce surface plasmon resonance (SPR) effects at a suitable wavelength range of the beam of radiation;

a set of detection elements, each detection element receiving a portion of a respective beam diffracted from the grating sensor, each diffracted beam corresponding to a diffractive order;

a transducer coupled to the set of detection elements that normalizes a measured intensity data for each diffractive order with respect to a reference beam intensity measured by a reference energy sensor;

a processor coupled to the transducer that determines if a characteristic loss of intensity caused by SPR is detected and adopts an appropriate calibration algorithm to quantify angular deviations of the beam of radiation by analyzing normalized intensity data for each diffractive order; and

an output indicator coupled to the processor that communicates an output to facilitate monitoring and calibration of a lithography tool, wherein the output is generated based on calculated angular deviation data yielded by the calibration algorithm.

2. The system of claim 1, wherein the system comprises N number of aperture holes and N number of grating sensors, wherein each aperture hole produces an incident beam directed towards a respective grating sensor.

3. The system of claim 2, wherein each of the N grating sensors produces M number of diffracted beams directed towards a corresponding P number of detection elements.

4. The system of claim 3, wherein the processor receives normalized intensity data from a total of P×

N number of detection elements corresponding to the N number of grating sensors.

5. The system of claim 2, wherein N is an even number, so that N/2 pairs of grating sensors are used.

6. The system of claim 5, wherein a first pair of grating sensors has a complementary second pair of grating sensors rotated (360/N)°

from the first pair of grating sensors about a central point.

7. The system of claim 1, further comprising:

a beam position controller that receives the output from the output indicator and uses data from the output to correct the angular deviation of the beam of radiation.

8. The system of claim 1, wherein the grating sensor comprises reflective grating.

9. The system of claim 1, wherein the grating sensor comprises transmissive grating.

10. The system of claim 1, wherein the grating sensor comprises a truncated cone with concentric grating lines produced around each circumferential slice of the truncated cone.

11. The system of claim 10, wherein the set of detection elements comprises a ring of detection elements surrounding the truncated cone, wherein the truncated cone and the ring of detection elements share a common central axis.

12. The system of claim 1, wherein the aperture comprises an annular opening.

13. The system of claim 1, wherein the grating sensor comprises a substrate and a film on a surface of the grating sensor that receives the incident beam, such that the substrate and film combination is configured to produce SPR effects.

14. The system of claim 13, wherein the substrate is a dielectric.

15. The system of claim 14, wherein the dielectric is silicon dioxide.

16. The system of claim 13, wherein the film is a metal.

17. The system of claim 16, wherein the metal is gold.

18. The system of claim 16, wherein the metal is aluminum.

19. A method for measuring angular deviations of a beam of radiation with respect to a nominal position, comprising:

producing the beam of radiation;

positioning an aperture and a grating sensor in an optical path of the beam, such that at least a portion of the beam of radiation, when passed through the aperture, is directed towards the grating sensor, wherein the grating sensor is configured to produce surface plasmon resonance (SPR) effects at a suitable wavelength range of the beam of radiation;

positioning a set of detection elements such that each detection element receives a portion of a respective beam diffracted from the grating sensor, each diffracted beam corresponding to a diffractive order;

normalizing a measured intensity data for each diffractive order with respect to a measured reference beam intensity;

comparing normalized intensity data for each diffractive order with expected SPR response to determine if a characteristic loss of intensity caused by SPR is detected;

adopting an appropriate calibration algorithm to yield data quantifying angular deviations of the beam of radiation; and

communicating an output to facilitate monitoring and calibration of a lithography tool, wherein the output is generated based on calculated angular deviation data.

20. The method of claim 19, further comprising:

correcting a position of the beam of radiation based on the angular deviation data.

21. The method of claim 19, wherein the adoption of calibration algorithm step comprises:

using intensity data from a single diffraction order when SPR effect is detected; and

using intensity data from an entire set of diffraction orders when SPR effect is not detected.