CHLORINE, FLUORINE AND LITHIUM CO-DOPED TRANSPARENT CONDUCTIVE FILMS AND METHODS FOR FABRICATING THE SAME

• US 20090162697A1
• Filed: 10/29/2008
• Published: 06/25/2009
• Est. Priority Date: 12/25/2007
• Status: Active Grant

• Current Assignee: Industrial Technology Research Institute
• Original Assignee: Industrial Technology Research Institute
• Inventors: Chiang, Mei-Ching, Cheng, Syh-Yuh, Lin, Chia-Hsin, Lin, Chin-Ching
• Granted Patent: US 8,163,404 B2
• Time in Patent Office: Days
• US Class Current: 428/702
• CPC Class Codes: C23C 16/407 of zinc, germanium, cadmium, indium, tin, thallium or bismuth
• CPC Class Codes: Y10T 428/12687 Pb- and Sn-base components: alternative to or next to each other
• CPC Class Codes: Y10T 428/12708 Sn-base component

Abstract

A chlorine, fluorine and lithium co-doped transparent conductive film is provided, including chlorine, fluorine and lithium co-doped tin oxides, wherein the chlorine, fluorine and lithium co-doped tin oxides have a chlorine ion doping concentration not greater than 5 atom %, a fluorine ion doping concentration not greater than 5 atom %, and a lithium ion doping concentration not greater than 5 atom %.

Claims

1. A chlorine, fluorine and lithium co-doped transparent conductive film, comprising:

chlorine, fluorine and lithium co-doped tin oxides, wherein the chlorine, fluorine and lithium co-doped tin oxides have a chlorine ion doping concentration not greater than 5 atom %, a fluorine ion doping concentration not greater than 5 atom %, and a lithium ion doping concentration not greater than 5 atom %.

2. The chlorine, fluorine and lithium co-doped transparent conductive film as claimed in claim 1, wherein the chlorine, fluorine and lithium co-doped tin oxides have a visible light transmittance greater than 80% while a thickness thereof is about 100-150 nm.

3. The chlorine, fluorine and lithium co-doped transparent conductive film as claimed in claim 1, wherein the chlorine, fluorine and lithium co-doped tin oxides have a visible light transmittance greater than 70% while a thickness thereof is about 150-250 nm.

4. The chlorine, fluorine and lithium co-doped transparent conductive film as claimed in claim 1, wherein the chlorine, fluorine and lithium co-doped tin oxides have a resistance of less than 5×

10<sup>−

4</sup> Ω

·

cm.

5. A method for fabricating a chlorine, fluorine and lithium co-doped transparent conductive film, comprising:

providing a substrate in a reaction chamber; and

providing a reaction gas and an oxygen-containing gas into the reaction chamber at a reaction temperature of about 200-850°

C. and a normal pressure and transferring the reaction gas to the substrate by the oxygen-containing gas, thereby forming the chlorine, fluorine and lithium co-doped transparent conductive film over the substrate, wherein the reaction gas is a vaporized gas obtained by vaporizing a mixture comprising a tin chloride, a fluorine-containing compound, and a lithium-containing compound at the reaction temperature.

6. The method as claimed in claim 5, wherein the oxygen-containing gas comprises air, oxygen or moisture.

7. The method as claimed in claim 5, wherein the fluorine-containing compound comprises ammonium fluoride, tin fluoride, zinc fluoride or aluminum fluoride, the lithium-containing compound comprises lithium nitrate, lithium acetate, lithium chloride, lithium carbonate, lithium oxalate, or lithium phosphate, and the tin chloride, the fluorine-containing compound, and the lithium-containing compound in the mixture have a weight ratio of about 100:

5;

5˜

100;

50;

50.

8. The method as claimed in claim 5, wherein the fluorine-containing compound and the lithium-containing compound comprise lithium fluoride, and the tin chloride and the lithium fluoride in the mixture have a weight ratio of about 100:

5˜

100;

50.

9. The method as claimed in claim 5, wherein the tin chloride is tin (II) chloride or tin (IV) chloride comprising two or more hydrates.

10. The method as claimed in claim 5, wherein the chlorine, fluorine and lithium co-doped transparent conductive film comprise a chlorine doping concentration of about 0.1-5 atom %.

11. The method as claimed in claim 5, wherein the chlorine, fluorine and lithium co-doped transparent conductive film comprises a fluorine doping concentration of about 0.1-5 atom %.

12. The method as claimed in claim 5, wherein the chlorine, fluorine and lithium co-doped transparent conductive film comprises a lithium doping concentration of about 0.1-5 atom %.

13. The method as claimed in claim 5, wherein the tin chloride has a melting point of about 200-850°

C.

14. The method as claimed in claim 5, wherein the mixture is vaporized by a thermal heating method or a plasma heating method.

15. The method as claimed in claim 5, wherein the chlorine, fluorine and lithium co-doped transparent conductive film has a thickness of about 100-500 nm.