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VAPOR DEPOSITION REACTOR

  • US 20090165715A1
  • Filed: 12/27/2007
  • Published: 07/02/2009
  • Est. Priority Date: 12/27/2007
  • Status: Active Grant
First Claim
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1. A vapor deposition reactor being configured to make a substrate pass by the reactor through a relative motion between the substrate and the reactor in a non-contact state, comprising:

  • an injection unit for receiving a precursor or a reactant; and

    an exhaust unit for receiving and pumping a purge gas,wherein the injection unit and the exhaust unit function as a basic module of the reactor and the configuration of the reactor is designed using the basic module, andwherein deposition conditions are varied according to a pressure in the injection unit.

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