Susceptor with Support Bosses
First Claim
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1. A susceptor for supporting a semiconductor wafer during a chemical vapor deposition process in a chemical vapor deposition device that includes a plurality of support posts, the susceptor comprising:
- a body having opposing upper and lower surfaces,at least one recess extending downward from the upper surface of the body for receiving a single semiconductor wafer therein during the chemical vapor deposition process,a plurality of support bosses extending downward from the lower face of the body, each of said support bosses having a boss opening, wherein the boss opening is sized and shaped for receiving a free end of one of the support posts of the chemical vapor deposition device to mount the susceptor on the support posts.
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Abstract
A susceptor for supporting a semiconductor wafer during a chemical vapor deposition process includes a body having opposing upper and lower surfaces. Support bosses extend downward from the lower face of the body. Each support boss has a boss opening sized and shaped for receiving a support post of a chemical vapor deposition device to mount the susceptor on the support post.
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Citations
17 Claims
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1. A susceptor for supporting a semiconductor wafer during a chemical vapor deposition process in a chemical vapor deposition device that includes a plurality of support posts, the susceptor comprising:
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a body having opposing upper and lower surfaces, at least one recess extending downward from the upper surface of the body for receiving a single semiconductor wafer therein during the chemical vapor deposition process, a plurality of support bosses extending downward from the lower face of the body, each of said support bosses having a boss opening, wherein the boss opening is sized and shaped for receiving a free end of one of the support posts of the chemical vapor deposition device to mount the susceptor on the support posts. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. An apparatus for conducting a chemical vapor deposition process, the apparatus comprising:
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a reaction chamber, a plurality of support posts disposed in the chamber, a susceptor for supporting a semiconductor wafer during the chemical vapor deposition process, the susceptor disposed in the reaction chamber, the susceptor comprising; a body having opposing upper and lower surfaces, a plurality of support bosses extending downward from the lower face of the body, each of said support bosses having a boss opening, wherein at least a free end of the support post is received within the boss opening to mount the susceptor on the support posts. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17)
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Specification