APPARATUS FOR TREATING SUBSTRATE
First Claim
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1. An apparatus for treating a substrate, comprising:
- a chamber including all upper lid;
a rear plate in the chamber;
a gas distributing plate under the rear plate, the gas distributing plate including a plurality of in section holes, the gas distributing plate combined with the upper lid using a plurality of first coupling means; and
a substrate holder under the gas distributing plate, the substrate holder having the substrate thereon.
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Abstract
An apparatus for treating a substrate includes: a chamber including an upper lid; a rear plate in the chamber; a gas distributing plate under the rear plate, the gas distributing plate including a plurality of injection holes, the gas distributing plate combined with the upper lid using a plurality of first coupling means; and a substrate holder under the gas distributing plate, the substrate holder having the substrate thereon.
275 Citations
15 Claims
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1. An apparatus for treating a substrate, comprising:
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a chamber including all upper lid; a rear plate in the chamber; a gas distributing plate under the rear plate, the gas distributing plate including a plurality of in section holes, the gas distributing plate combined with the upper lid using a plurality of first coupling means; and a substrate holder under the gas distributing plate, the substrate holder having the substrate thereon. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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Specification