Stacked-Type Photoelectric Conversion Device
First Claim
1. A stacked-type photoelectric conversion device comprising an amorphous silicon-based photoelectric conversion unit and a crystalline silicon-based photoelectric conversion unit stacked thereon or vice versa, whereinan amorphous photoelectric conversion layer included in said amorphous photoelectric conversion unit has a thickness of at least 0.03 μ
- m and less than 0.17 μ
m, and a crystalline photoelectric conversion layer included in said crystalline photoelectric conversion unit has a thickness of at least 0.2 μ
m and less than 1.0 μ
m, anda silicon oxide layer of a first conductivity type included in said amorphous photoelectric conversion unit and a silicon layer of a second conductivity type included in said crystalline photoelectric conversion unit makes a junction.
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Abstract
The present invention makes it possible to provide a stacked-type thin-film photoelectric conversion device having high photostability, at a high yield rate and significantly reduced production costs. In a stacked-type photoelectric conversion device having an amorphous silicon-based photoelectric conversion unit and a crystalline silicon-based photoelectric conversion unit stacked thereon or vice versa, an amorphous photoelectric conversion layer included in the amorphous photoelectric conversion unit has a thickness of at least 0.03 μm and less than 0.17 μm, a crystalline photoelectric conversion layer included in the crystalline photoelectric conversion unit has a thickness of at least 0.2 μm and less than 1.0 μm, and a silicon oxide layer of a first conductivity type included in the amorphous photoelectric conversion unit and a silicon layer of a second conductivity type included in the crystalline photoelectric conversion unit make a junction.
13 Citations
6 Claims
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1. A stacked-type photoelectric conversion device comprising an amorphous silicon-based photoelectric conversion unit and a crystalline silicon-based photoelectric conversion unit stacked thereon or vice versa, wherein
an amorphous photoelectric conversion layer included in said amorphous photoelectric conversion unit has a thickness of at least 0.03 μ - m and less than 0.17 μ
m, and a crystalline photoelectric conversion layer included in said crystalline photoelectric conversion unit has a thickness of at least 0.2 μ
m and less than 1.0 μ
m, anda silicon oxide layer of a first conductivity type included in said amorphous photoelectric conversion unit and a silicon layer of a second conductivity type included in said crystalline photoelectric conversion unit makes a junction. - View Dependent Claims (2, 3, 4, 5, 6)
- m and less than 0.17 μ
Specification