RF electron source for ionizing gas clusters

• US 20090166555A1
• Filed: 12/28/2007
• Published: 07/02/2009
• Est. Priority Date: 12/28/2007
• Status: Abandoned Application

• Current Assignee: Varian Semiconductor Equipment Associates Incorporated (Applied Materials Incorporated)
• Original Assignee: Varian Semiconductor Equipment Associates Incorporated (Applied Materials Incorporated)
• Inventors: Olson, Joseph C., Scheuer, Jay T.
• Application Number:
  US12/005,757
• Publication Number:
  US 20090166555A1
• Time in Patent Office: Days
• US Class Current: 250/427
• CPC Class Codes: H01J 2237/061 Construction
• CPC Class Codes: H01J 2237/06366 Gas discharge electron sources
• CPC Class Codes: H01J 2237/0812 Ionized cluster beam [ICB] sources
• CPC Class Codes: H01J 2237/31701 Ion implantation
• CPC Class Codes: H01J 27/026 Cluster ion sources
• CPC Class Codes: H01J 27/18 with an applied axial magnetic field
• CPC Class Codes: H01J 37/08 Ion sources; Ion guns
• CPC Class Codes: H01J 37/30 Electron-beam or ion-beam tubes for localised treatment of objects
• CPC Class Codes: H01J 37/31 for cutting or drilling methods for cutting or drilling metals with electron beams B23K15/00

Abstract

The present invention discloses a system and method for generating gas cluster ion beams (GCIB) having very low metallic contaminants. Gas cluster ion beam systems are plagued by high metallic contamination, thereby affecting their utility in many applications. This contamination is caused by the use of thermionic sources, which impart contaminants and are also susceptible to short lifecycles due to their elevated operating temperatures. While earlier modifications have focused on isolating the filament from the source gas cluster as much as possible, the present invention represents a significant advancement by eliminating the thermionic source completely. In the preferred embodiment, an inductively coupled plasma and ionization region replaces the thermionic source and ionizer of the prior art. Through the use of RF or microwave frequency electromagnetic waves, plasma can be created in the absence of a filament, thereby eliminating a major contributor of metallic contaminants.

Claims

1. An ionizer for forming a gas cluster ion beam, comprising:

a. an inlet through which a gas cluster is injected into an ionization region;

b. an inductively coupled electromagnetic electron source for providing electrons into said ionization region;

c. an outlet through which said gas cluster ion beam passes; and

d. said ionization region, partially defined by said inlet and said outlet, wherein said electrons ionize a portion of said gas cluster to form said gas cluster ion beam.

2. The ionizer of claim 1, wherein said ionization region comprising outer walls that are negatively biased so as to repel said electrons toward said gas cluster.

3. The ionizer of claim 2, wherein said ionization region further comprises at least one positively biased electrode, located between said outer walls.

4. The ionizer of claim 3, wherein said outer walls and said electrode comprise a non-metallic material.

5. The ionizer of claim 4, wherein said outer walls and said electrode comprise graphite.

6. The ionizer of claim 1, wherein said inductively coupled electromagnetic electron source comprises a plasma chamber having at least one aperture in communication with said ionization region, a gas inlet in communication with said plasma chamber, and a electromagnetic power source.

7. The ionizer of claim 6, wherein said electromagnetic power source is coupled to said plasma chamber via a dielectric plate.

8. The ionizer of claim 7, wherein said electromagnetic power source comprises an energizing coil in communication with said dielectric plate.

9. The ionizer of claim 6, wherein said plasma chamber comprises magnets positioned outside the walls of said chamber for providing a magnetic field to confine the plasma produced by said gas and said electromagnetic power.

10. The ionizer of claim 9, wherein said magnetic field generates magnetic cusps.

11. The ionizer of claim 9, wherein said magnetic field generates magnetic dipoles.

12. The ionizer of claim 1, wherein said ionization region comprises magnets positioned outside the walls of said region for providing a magnetic field within said ionization region.

13. The ionizer of claim 12, wherein said magnetic field generates magnetic cusps.

14. A process for creating a gas cluster ion beam, comprising:

a. injecting gas clusters into an ionization region;

b. using electromagnetic energy to generate a plasma; and

c. directing electrons from said plasma to said ionization region, where they ionize said gas clusters.

15. The process of claim 14, further comprising:

a. providing a plasma chamber having a gas inlet, and a dielectric plate, and a coil, outside of said plasma chamber, in communication with said dielectric plate; and

an electromagnetic power supply;

b. injecting a source gas into said chamber via said inlet; and

c. energizing said coil with said power supply.

16. The process of claim 14, wherein said ionization region comprises outer walls, and further comprising negatively biasing said outer walls.

17. The process of claim 14, further comprising:

a. providing at least one positively biased electrode within said ionization region to accelerate said electrons.

18. The process of claim 14, further comprising:

a. providing a magnetic field within said ionization region so as to confine and accelerate said electrons within said region.