Enhanced Multi Channel Alignment
First Claim
Patent Images
1. An imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate, the system comprising:
- a first set of imaging units positioned at a first acute angle relative to normal of the substrate; and
a second set of imaging units positioned at a second acute angle relative to normal of the substrate, wherein the first and second angles are not equal to each other.
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Abstract
An imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate, the system including, inter alia, a first set of imaging units positioned at a first angle relative to normal of the substrate; and a second set of imaging units positioned at a second angle relative to normal of the substrate, wherein the first and second angles are not equal to each other.
102 Citations
21 Claims
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1. An imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate, the system comprising:
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a first set of imaging units positioned at a first acute angle relative to normal of the substrate; and a second set of imaging units positioned at a second acute angle relative to normal of the substrate, wherein the first and second angles are not equal to each other. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. An imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate, the system comprising:
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a first N-channel imaging system positioned at a first angle, the first N-channel imaging system including a plurality of imaging sets, the imaging sets having a first imaging unit and a second imaging unit positioned at an acute angle to each other; a second N-channel imaging system positioned at an angle to the first N-channel imaging system, the second N-channel imaging system including a plurality of imaging sets; and
,a beam splitter operable for directing imaging light beams from the first N-channel imaging system and the second N-channel imaging system towards the substrate. - View Dependent Claims (15, 16, 17, 18)
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19. An imprint lithography system comprising:
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an energy source positioned to emit energy along a path, the energy capable of solidifying material deposited between an imprint mold and a substrate; a first set of imaging units positioned at a first inclined angle relative to normal of the substrate; and a second set of imaging units positioned at a second inclined angle relative to normal of the substrate, wherein the first and second angles are not equal to each other. - View Dependent Claims (20, 21)
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Specification