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MASK, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

  • US 20090170014A1
  • Filed: 03/06/2009
  • Published: 07/02/2009
  • Est. Priority Date: 09/08/2006
  • Status: Active Grant
First Claim
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1. A mask which is used to form an image of a pattern on a substrate via a projection optical system, comprising:

  • a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis; and

    a circular cylinder-shaped body which has the pattern formation surface, and which is able to rotate, with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction,wherein, when a diameter of the mask on the pattern formation surface is taken as D, and a maximum length of the substrate in the one-dimensional direction is taken as L, and a projection ratio of the projection optical system is taken as β

    , and circumference ratio is taken as π

    , then the conditions for D≧



    ×

    L)/π

    are satisfied.

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