MASK, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

• US 20090170014A1
• Filed: 03/06/2009
• Published: 07/02/2009
• Est. Priority Date: 09/08/2006
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: SHIBAZAKI, YUICHI
• Granted Patent: US 8,609,301 B2
• Time in Patent Office: Days
• US Class Current: 430/5
• CPC Class Codes: G03F 1/38 Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
• CPC Class Codes: G03F 7/201 characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
• CPC Class Codes: G03F 7/2035 simultaneous coating and exposure; using a belt mask, e.g. endless
• CPC Class Codes: G03F 7/703 Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates
• CPC Class Codes: G03F 7/70358 Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
• CPC Class Codes: G03F 9/00 Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically G03F7/22 takes precedence; preparation of photographic masks G03F1/00; within photographic printing apparatus for making copies G03B27/00
• CPC Class Codes: G03F 9/70 for microlithography measuring printed patterns for monitoring overlay G03F7/70633 or focus G03F7/70641; projection system adjustment G03F7/70258; position control G03F7/70775
• CPC Class Codes: G03F 9/7023 Aligning or positioning in direction perpendicular to substrate surface

Abstract

A circular cylinder-shaped mask is used to form an image of a pattern on a substrate via a projection optical system. The mask has a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis, and the mask is able to rotate, with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction. When a diameter of the mask on the pattern formation surface is taken as D, and a maximum length of the substrate in the one-dimensional direction is taken as L, and a projection ratio of the projection optical system is taken as β, and circumference ratio is taken as π, then the conditions for D≧(β×L)/π are satisfied.

Claims

1. A mask which is used to form an image of a pattern on a substrate via a projection optical system, comprising:

a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis; and

a circular cylinder-shaped body which has the pattern formation surface, and which is able to rotate, with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction,

wherein, when a diameter of the mask on the pattern formation surface is taken as D, and a maximum length of the substrate in the one-dimensional direction is taken as L, and a projection ratio of the projection optical system is taken as β

, and circumference ratio is taken as π

, then the conditions for D≧

(β

×

L)/π

are satisfied.

3. The mask according to claim 1, wherein the pattern has a plurality of patterns which are aligned in the circumferential direction on the pattern formation surface.

4. The mask according to claim 3, wherein

a plurality of shot areas onto each of which the image of the pattern is projected are provided in at least the one-dimensional direction on the substrate, and

the number of the patterns in the circumferential direction of the pattern formation surface is the maximum number of the shot areas in at least the one-dimensional direction.

5. The mask according to claim 1, wherein

the substrate has a substantially circular shape, and

the length L comprises a diameter of the substrate.

6. The mask according to claim 1, further comprising:

a pellicle which is formed in a circular cylinder shape so as to cover the pattern formation surface; and

a support member which supports the pellicle.

7. The mask according to claim 6, wherein the support member is formed in a predetermined area on each of one end side and another end side in the predetermined direction of the pattern formation surface, and extending in the circumferential direction of the pattern formation surface so as to encircle the predetermined axis.

8. An exposure apparatus which, using the mask described in claim 1, exposes a substrate with an image of a pattern formed on the mask, comprising:

a mask driving apparatus which is able to rotate the mask with the predetermined axis taken as an axis of rotation;

a substrate driving apparatus which is able to move the substrate in at least a predetermined one-dimensional direction in synchronization with the rotation of the mask; and

a projection optical system that projects the image of the pattern on the mask onto the substrate.

9. The exposure apparatus according to claim 8, further comprising:

a holding member which removably holds a side surface of the mask,

wherein the mask driving apparatus comprises an actuator which is able to rotate the holding member which is holding the mask.

11. The exposure apparatus according to claim 9, wherein the holding member has a suctioning mechanism which is able to suction the side surface of the mask.

12. The exposure apparatus according to claim 9, further comprising:

a shaft member which rotatably supports the holding member with the predetermined axis taken as the axis of rotation,

wherein the holding member is placed on one end side of the shaft member.

13. The exposure apparatus according to claim 9, further comprising:

a mask driving apparatus that can rotate the holding member, which is holding the mask, with the predetermined axis taken as the axis of rotation, and that can move the holding member, which is holding the mask, in directions of six degrees of freedom.

15. The exposure apparatus according to claim 13, wherein the mask driving apparatus comprises an actuator which can be driven by means of Lorentz'"'"'s force.

16. The exposure apparatus according to claim 13, further comprising:

a shaft member which rotatably supports the holding member which is holding the mask with the predetermined axis taken as an axis of rotation,

wherein the mask driving apparatus comprises a first driving mechanism which is able to move the holding member in at least the rotation direction, and a second driving mechanism which is able to move the shaft member in a predetermined direction.

17. The exposure apparatus according to claim 16, wherein the first driving mechanism has a rotor which can be mounted on the holding member side, and a stator which can be mounted on the shaft member side.

18. The exposure apparatus according to claim 13, further comprising:

an anti-vibration apparatus which suppresses vibration which is created by a movement of the holding member.

19. The exposure apparatus according to claim 18, wherein the anti-vibration apparatus comprises a countermass which absorbs reaction force created by a rotation of the holding member.

21. The exposure apparatus according to claim 19, wherein the countermass rotates in the opposite direction from the mask due to a reaction force which is created by a rotation of the mask.

22. The exposure apparatus according to claim 21, further comprising:

a holding mechanism which is able to hold the countermass such that the countermass can be displaced by a predetermined amount.

23. The exposure apparatus according to claim 22, wherein the holding mechanism restricts any rotation of the countermass which is greater than a predetermined amount.

24. The exposure apparatus according to claim 22, wherein the holding mechanism comprises an actuator which can be driven by means of Lorentz'"'"'s force.

25. The exposure apparatus according to claim 24, wherein the position of the countermass can be adjusted.

26. The exposure apparatus according to claim 21, further comprising:

a holding member which holds the mask;

a shaft member which rotatably supports the holding member with the predetermined axis taken as the axis of rotation; and

a support member which rotatably supports the shaft member,

wherein the countermass comprises the shaft member.

27. The exposure apparatus according to claim 26, further comprising:

a weight member which is placed at one end side of the shaft member,

wherein the holding member is placed at the other end side of the shaft member, and

the support member is placed between the holding member and the weight member.

30. The exposure apparatus according to claim 8, further comprising:

an illumination system which is able to illuminate a pattern formation surface of the mask with exposure light,

wherein the exposure light which has been irradiated onto the pattern formation surface and has been reflected by the pattern formation surface is irradiated onto the substrate.

31. The exposure apparatus according to claim 8, wherein the exposure light is irradiated onto the pattern formation surface while the mask is being rotated with the predetermined axis taken as the axis of rotation.

32. A device manufacturing method which uses the exposure apparatus according to claim 8.

2. A mask which is used to form an image of a pattern on a substrate via a projection optical system, comprising:

a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis; and

a circular cylinder-shaped body which has the pattern formation surface, and which is able to rotate, with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction,

wherein, when a diameter of the mask on the pattern formation surface is taken as D, and a maximum length of the substrate in the one-dimensional direction is taken as L, and a projection ratio of the projection optical system is taken as β

, and circumference ratio is taken as π

, then the conditions for (β

×

L)/π

>

D≧

(β

×

L)/(2×

π

) are satisfied.

10. An exposure apparatus which exposes a substrate with an image of a pattern, comprising:

a holding member which removably holds a side surface of a circular cylinder-shaped mask which has a pattern formation surface on which the pattern is formed and which is placed around the predetermined axis.

14. An exposure apparatus which exposes a substrate with an image of a pattern, comprising:

a holding member which holds a circular cylinder-shaped mask which has a pattern formation surface on which the pattern is formed and which is placed around a predetermined axis; and

a mask driving apparatus which is able to move the holding member, which is holding the mask, in directions of six degrees of freedom.

20. An exposure apparatus which exposes a substrate with an image of a pattern, comprising:

a mask driving apparatus which is able to rotate a circular cylinder-shaped mask which has a pattern formation surface on which the pattern is formed and which is placed around the predetermined axis; and

a countermass which absorbs reaction force created by a rotation of the mask.

28. An exposure apparatus which exposes a substrate with an image of a pattern, comprising:

a holding member which holds a circular cylinder-shaped mask which has a pattern formation surface on which the pattern is formed and which is formed around the predetermined axis;

a shaft member which rotatably supports the holding member with the predetermined axis taken as the axis of rotation, and which has the holding member placed at one end side thereof;

a support member which rotatably support the shaft member; and

a weight member which is placed at the other end side of the shaft member, and which has the support member placed between itself and the holding member.

29. The exposure apparatus according to claim 28, further comprising:

a mask driving apparatus which is able to move a holding member which is holding the mask in directions of six degrees of freedom,

wherein the mask driving apparatus comprises a first driving mechanism which is able to move the holding member in at least the rotation direction, and a second driving mechanism which is able to move the support member in a predetermined direction together with the shaft member.