Method of making a pillar pattern using triple or quadruple exposure
First Claim
Patent Images
1. A method of making a device, comprising:
- forming a photoresist layer over a substrate;
performing a first exposure of the photoresist layer using a first mask to form first exposed regions in the photoresist layer;
performing a second exposure of the photoresist layer using a second mask to form second exposed regions in the photoresist layer;
performing a third exposure of the photoresist layer using a third mask to form third exposed regions in the photoresist layer, such that each adjacent first, second and third exposed regions are approximately equidistant from each other;
patterning the photoresist layer after the first, the second and the third exposures;
etching the substrate using the patterned photoresist layer; and
forming a plurality of pillar shaped devices arranged in a substantially hexagonal pattern.
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Abstract
Methods of making pillar shaped device array using a triple or quadruple exposure technique are described. A plurality of pillar shaped devices are formed arranged in a hexagonal or rectangular pattern.
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Citations
15 Claims
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1. A method of making a device, comprising:
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forming a photoresist layer over a substrate; performing a first exposure of the photoresist layer using a first mask to form first exposed regions in the photoresist layer; performing a second exposure of the photoresist layer using a second mask to form second exposed regions in the photoresist layer; performing a third exposure of the photoresist layer using a third mask to form third exposed regions in the photoresist layer, such that each adjacent first, second and third exposed regions are approximately equidistant from each other; patterning the photoresist layer after the first, the second and the third exposures; etching the substrate using the patterned photoresist layer; and forming a plurality of pillar shaped devices arranged in a substantially hexagonal pattern. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method of making a device, comprising:
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forming at least one semiconductor layer over first conductor lines; forming a first photoresist layer over the at least one semiconductor layer; performing a first exposure of the first photoresist layer using a first mask to form first exposed regions in the first photoresist layer; performing a second exposure of the first photoresist layer using a second mask to form second exposed regions in the first photoresist layer; performing a third exposure of the first photoresist layer using a third mask to form third exposed regions in the first photoresist layer; performing a fourth exposure of the first photoresist layer using a fourth mask to form fourth exposed regions in the first photoresist layer; patterning the first photoresist layer after the first, the second, the third and the fourth exposures; etching the at least one semiconductor layer to form a plurality of pillar shaped devices; and forming a plurality of second conductor lines over the plurality of pillar shaped devices. - View Dependent Claims (13, 14, 15)
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Specification