Light-Sensing Device for Multi-Spectral Imaging
First Claim
1. A light-sensing device comprising a semiconductor substrate and photodiodes formed thereon, wherein the semiconductor substrate includes side-by-side active areas implanted therein and CMOS devices, said active areas having a defined polarity and said active areas being electrically isolated from one another and from the adjacent CMOS device by isolation regions (FOX), the photodiodes having a light-sensing region comprising a stack of layers with at least one superlattice region having interleaved well and barrier layers, wherein light can be absorbed in a first type of photodiode by the generation of electron-hole pairs through miniband-to-miniband transitions, and in a second type of photodiode by intersubband transitions, the photodiodes of the first and second types being formed in one single epitaxial growth step on said active areas.
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Abstract
A method of fabricating multi-spectral photo-sensors including photo-diodes incorporating stacked epitaxial superlattices monolithically integrated with CMOS devices on a common semiconductor substrate.
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17 Claims
- 1. A light-sensing device comprising a semiconductor substrate and photodiodes formed thereon, wherein the semiconductor substrate includes side-by-side active areas implanted therein and CMOS devices, said active areas having a defined polarity and said active areas being electrically isolated from one another and from the adjacent CMOS device by isolation regions (FOX), the photodiodes having a light-sensing region comprising a stack of layers with at least one superlattice region having interleaved well and barrier layers, wherein light can be absorbed in a first type of photodiode by the generation of electron-hole pairs through miniband-to-miniband transitions, and in a second type of photodiode by intersubband transitions, the photodiodes of the first and second types being formed in one single epitaxial growth step on said active areas.
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