Lithographic apparatus and device manufacturing method
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Abstract
A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
104 Citations
54 Claims
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1-34. -34. (canceled)
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35. A method of patterning a substrate, the method comprising:
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measuring at a measurement station a height, a tilt, or both of each of the plurality of points on the substrate, wherein the measuring is not performed through liquid adjacent to the substrate; moving the substrate from the measurement station to an exposure station; providing a liquid at the exposure station in a space between a projection system and the substrate; moving one or more of the plurality of points to a focal point of the projection system based on the measuring; and projecting a patterned beam through the liquid onto a target portion of the substrate. - View Dependent Claims (36, 37, 38, 39, 40, 41, 42, 43)
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44. A method of patterning a substrate, the method comprising:
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measuring at a measurement station a height, a tilt, or both, of each of a plurality of points on a first substrate, wherein the measuring is not performed through liquid adjacent to the substrate; moving the first substrate from the measurement station to an exposure station physically separated from the measurement station; providing a liquid at the exposure station in a space between a projection system and the first substrate; moving one or more of the plurality of points of the first substrate to a focal point of the projection system based on the measuring; projecting a patterned beam through the liquid onto a target portion of the first substrate; and measuring a second substrate at the measurement station at least partially overlapping in time with exposure of the first substrate at the exposure station. - View Dependent Claims (45, 46, 47, 48, 49, 50, 51)
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52. A method of patterning a substrate, the method comprising:
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measuring at a measurement station a height, a tilt, or both, of each of a plurality of points on the substrate, wherein the measuring is not performed through liquid adjacent to the substrate; applying a correction to the measuring to account for the absence of liquid adjacent to the substrate; moving the substrate from the measurement station to an exposure station; providing a liquid at the exposure station in a space between a projection system and the substrate; moving one or more of the plurality of points to a focal point of the projection system based on the measuring; and projecting a patterned beam through the liquid onto a target portion of the substrate.
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53. A method of patterning a substrate, the method comprising:
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measuring using a first table, wherein the measuring is not performed through liquid adjacent to the first table; moving a substrate on a second, separate table into an optical path of a projection system; providing a liquid in a space between the projection system and the substrate; and projecting a patterned beam through the liquid onto a target portion of the substrate. - View Dependent Claims (54)
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Specification