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Projection exposure apparatus, projection exposure method, and method for producing device

  • US 20090190113A1
  • Filed: 03/27/2009
  • Published: 07/30/2009
  • Est. Priority Date: 09/29/2003
  • Status: Abandoned Application
First Claim
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1. A projection exposure apparatus which transfers a pattern formed on a mask onto a substrate through a liquid, the projection exposure apparatus comprising:

  • a projection optical system which projects an image of the pattern onto the substrate; and

    an electricity removal unit which removes electricity from the liquid to be supplied to a space between the projection optical system and a surface of the substrate.

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