PELLICLE FRAME
First Claim
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1. A pellicle used in semiconductor lithography, characterized in that a cross-sectional area of a pellicle frame is 6 mm2 or less.
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Abstract
The present invention is directed to provide a pellicle that can control the deformation of the photomask to a minimum without particular consideration of the flatness of a pellicle frame even in the case where a pellicle is affixed to a photomask for lithography. In the pellicle of the present invention, a cross-sectional area of a pellicle frame is 6 mm2 or less. In the pellicle of the present invention, a pellicle frame is made of a material having a Young'"'"'s modulus of 50 GPa or less.
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Citations
2 Claims
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1. A pellicle used in semiconductor lithography, characterized in that a cross-sectional area of a pellicle frame is 6 mm2 or less.
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2. A pellicle used in semiconductor lithography, characterized in that a pellicle frame is made of a material having a Young'"'"'s modulus of 50 GPa or less.
Specification