METHOD FOR INCREASING THE PENETRATION DEPTH OF MATERIAL INFUSION IN A SUBSTRATE USING A GAS CLUSTER ION BEAM
First Claim
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1. A method for infusing material within a surface of a substrate, comprising:
- modifying a surface condition of a surface on a substrate to produce a modified surface layer; and
thereafter, infusing material into said modified surface layer in said substrate by exposing said substrate to a gas cluster ion beam (GCIB) comprising said material.
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Abstract
A method for infusing material below the surface of a substrate is described. The method comprises modifying a surface condition of a surface on a substrate to produce a modified surface layer, and thereafter, infusing material into the modified surface in the substrate by exposing the substrate to a gas cluster ion beam (GCIB) comprising the material.
25 Citations
25 Claims
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1. A method for infusing material within a surface of a substrate, comprising:
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modifying a surface condition of a surface on a substrate to produce a modified surface layer; and thereafter, infusing material into said modified surface layer in said substrate by exposing said substrate to a gas cluster ion beam (GCIB) comprising said material. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A method for infusing material within a surface of a substrate, comprising:
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treating a surface on a substrate using a first GCIB in order to modify a surface condition of said surface on said substrate to produce a modified surface layer; and thereafter, infusing material into said modified surface layer in said substrate by exposing said substrate to a second GCIB comprising said material. - View Dependent Claims (21, 22, 23, 24, 25)
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Specification