Front electrode having etched surface for use in photovoltaic device and method of making same

• US 20090194155A1
• Filed: 02/01/2008
• Published: 08/06/2009
• Est. Priority Date: 02/01/2008
• Status: Abandoned Application

• Current Assignee: Guardian Glass LLC (KOCH Industries Incorporated)
• Original Assignee: Guardian Industries Corporation (KOCH Industries Incorporated)
• Inventors: den Boer, Willem, Krasnov, Alexey, Vanderploeg, John A.
• Application Number:
  US12/068,119
• Publication Number:
  US 20090194155A1
• Time in Patent Office: Days
• US Class Current: 136/256
• CPC Class Codes: H01L 31/022466 made of transparent conductive layers, e.g. TCO, ITO layers
• CPC Class Codes: H01L 31/0236 Special surface textures
• CPC Class Codes: H01L 31/1884 Manufacture of transparent electrodes, e.g. TCO, ITO
• CPC Class Codes: Y02E 10/50 Photovoltaic [PV] energy

Abstract

Certain example embodiments of this invention relate to a photovoltaic (PV) device including an electrode such as a front electrode/contact, and a method of making the same. In certain example embodiments, the front electrode has a textured (e.g., etched) surface that faces the photovoltaic semiconductor film of the PV device. In certain example embodiments, the front electrode is formed on a flat or substantially flat (non-textured) surface of a glass substrate (e.g., via sputtering), and the surface of the front electrode is textured (e.g., via etching). In completing manufacture of the PV device, the etched surface of the front electrode faces the active semiconductor film of the PV device.

Claims

1. A photovoltaic device comprising:

a front glass substrate;

a front electrode provided between the front glass substrate and a semiconductor film of the photovoltaic device, wherein the front electrode comprises a silver-based conductive layer and a transparent conductive oxide (TCO) layer, the TCO layer being provided between the silver-based layer and the semiconductor film of the photovoltaic device;

wherein a major surface of the TCO layer closest to the semiconductor film is etched so as to be textured; and

wherein the TCO layer is graded with respect to density so that a first portion of the TCO layer closer to the silver-based layer has a higher density than does a second portion of the TCO layer farther from the silver-based layer.

2. The photovoltaic device of claim 1, wherein the first and second portions of the TCO layer each comprise zinc oxide.

3. The photovoltaic device of claim 1, wherein the first and second portions of the TCO layer comprise different materials.

4. The photovoltaic device of claim 1, wherein the first and second portions of the TCO layer are of the same material.

5. The photovoltaic device of claim 1, further comprising a layer comprising Ni and/or Cr provided between at least the silver-based layer and the TCO layer.

6. The photovoltaic device of claim 1, wherein the semiconductor film comprises amorphous silicon.

7. The photovoltaic device of claim 1, further comprising a layer comprising zinc oxide between the front glass substrate and the silver-based layer, said layer comprising zinc oxide contacting the silver-based layer.

8. The photovoltaic device of claim 1, wherein the textured surface of the TCO layer has an average RMS roughness value of from about 10-50 nm.

9. The photovoltaic device of claim 1, wherein the textured surface of the TCO layer has an average RMS roughness value of from about 15-40 nm.

10. The photovoltaic device of claim 1, wherein a major surface of the front glass substrate facing the front electrode is smooth and is not textured.

11. A photovoltaic device comprising:

a front glass substrate;

a front electrode provided between the front glass substrate and a semiconductor film of the photovoltaic device, wherein the front electrode comprises, in this order moving away from the front glass substrate, a silver-based conductive layer, a buffer layer comprising metal oxide, and a transparent conductive oxide (TCO) layer, the TCO layer being provided between at least the silver-based layer and the semiconductor film of the photovoltaic device;

wherein a major surface of the TCO layer closest to the semiconductor film is etched so as to be textured; and

wherein the buffer layer is more resistant to etching than is the TCO layer.

12. The photovoltaic device of claim 11, wherein the textured surface of the TCO layer has an average RMS roughness value of from about 10-50 nm.

13. The photovoltaic device of claim 11, wherein the textured surface of the TCO layer has an average RMS roughness value of from about 15-40 nm.

14. The photovoltaic device of claim 11, wherein the buffer layer comprises tin oxide.

15. The photovoltaic device of claim 11, wherein the buffer layer is thinner than the TCO layer.

16. The photovoltaic device of claim 11, wherein the buffer layer comprises tin oxide and the TCO layer comprises zinc oxide.

17. The photovoltaic device of claim 11, further comprising a layer comprising Ni and/or Cr provided between at least the silver-based layer and the buffer layer.

18. The photovoltaic device of claim 11, wherein the semiconductor film comprises amorphous silicon.

19. The photovoltaic device of claim 11, further comprising a layer comprising zinc oxide between the front glass substrate and the silver-based layer, said layer comprising zinc oxide contacting the silver-based layer.

20. The photovoltaic device of claim 11, wherein a major surface of the front glass substrate facing the front electrode is smooth and is not textured.

22. The method of claim 19, wherein the TCO comprises zinc oxide.

23. The method of claim 19, wherein the multilayer electrode comprises a silver-based layer and the TCO layer, wherein the TCO layer is closer to the semiconductor film of the photovoltaic device than is the silver-based layer.

24. The method of claim 19, wherein the etching comprises exposing the surface of the TCO layer to one or more of acetic acid and hydrochloric acid.

25. The method of claim 19, wherein the heat treating is performed for from about 10-60 minutes.

26. The method of claim 19, wherein the etching is performed so that the resulting textured surface of the TCO layer has an average RMS roughness value of from about 10-50 nm.

27. The method of claim 19, wherein the etching is performed using a mixture comprising vinegar and water.

21. A method of making a photovoltaic device, the method comprising:

sputter-depositing a multilayer electrode on a glass substrate at approximately room temperature;

heat treating the multilayer electrode at from about 50-400 degrees C. in order to densify at least a transparent conductive oxide (TCO) layer of the electrode;

after the heat treating, etching a major exposed surface of the heat treated TCO layer of the electrode in order to form a textured surface; and

arranging the textured surface of the TCO layer so as to face a semiconductor film of the photovoltaic device.

28. A method of making a photovoltaic device, the method comprising:

sputter-depositing a multilayer electrode, including at least one TCO layer, on a glass substrate at approximately room temperature;

etching a surface of the TCO layer to form a textured surface;

arranging the textured surface of the TCO layer so as to face a semiconductor film of the photovoltaic device; and

adjusting at least one sputtering parameter when sputter-depositing the multilayer electrode so that the TCO layer is deposited so as to have portions of different density, wherein a first portion of the TCO layer closer to the glass substrate has a higher density than does a second portion of the TCO layer farther from the glass substrate.

29. The method of claim 28, wherein the TCO comprises zinc oxide.

30. The method of claim 28, wherein the multilayer electrode comprises a silver-based layer and the TCO layer, wherein the TCO layer is closer to a semiconductor film of the photovoltaic device than is the silver-based layer.

31. The method of claim 28, wherein the etching comprises exposing the surface of the TCO layer to one or more of acetic acid and hydrochloric acid.

32. The method of claim 28, wherein the etching is performed so that the resulting textured surface of the TCO layer has an average RMS roughness value of from about 10-50 nm.

33. The method of claim 28, further comprising heat treating the multilayer electrode at from about 50-400 degrees C. prior to the etching.

34. The method of claim 28, wherein the sputtering parameter is pressure.

35. The method of claim 28, wherein the etching is performed using a mixture comprising vinegar and water.

36. A photovoltaic device comprising:

a front glass substrate;

a front electrode provided between the front glass substrate and a semiconductor film of the photovoltaic device, wherein the front electrode comprises a silver-based conductive layer and a transparent conductive oxide (TCO) layer, the TCO layer being provided between the silver-based layer and the semiconductor film of the photovoltaic device; and

wherein a major surface of the TCO layer closest to the semiconductor film is etched so as to be textured.

37. The photovoltaic device of claim 36, wherein after etching the front glass substrate with the etched front electrode thereon has a haze value of from about 10-15%.