NEW METAL PRECURSORS CONTAINING BETA-DIKETIMINATO LIGANDS
First Claim
1. A method for depositing a metal containing thin film on a substrate;
- comprising;
a) introducing a vapor phase metal-organic precursor into a reaction chamber containing one or more substrates, wherein the precursor comprises a compound with at least one β
-diketiminato ligand, and which has the general formula;
M(R1C(NR4)CR2C(NR5)R3)2Ln wherein;
M is a metal selected from the group consisting of;
nickel, cobalt, ruthenium, iridium, palladium, platinum, silver and gold;
each of R1-5 is an organic ligand independently selected from the group consisting of;
H; and
a C1-C4 linear or branched, alky group, alkylsilyl group, alkylamide group, alkoxide group, or alkylsilylamide group;
each L is independently selected from the group consisting of;
a hydrocarbon;
an oxygen-containing hydrocarbon;
an amine;
a polyamine;
a bipyridine;
an oxygen containing heterocycle;
a nitrogen containing heterocycle; and
combinations thereof; and
n is an integer ranging from 0 to 4, inclusive;
b) depositing a metal containing film onto the substrate, wherein the substrate is maintained at a temperature between about 100°
C. and about 500°
C.
1 Assignment
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Accused Products
Abstract
Methods and compositions for depositing a metal containing thin film on a substrate comprises introducing a vapor phase metal-organic precursor into a reaction chamber containing one or more substrates. The precursor has at least one β-diketiminato ligand, and has the general formula:
M(R1C(NR4)CR2C(NR5)R3)2Ln
wherein M is a metal selected from nickel, cobalt, ruthenium, iridium, palladium, platinum, silver and gold. Each of R1-5 is an organic ligand independently selected from H; and a C1-C4 linear or branched, alky group, alkylsilyl group, alkylamide group, alkoxide group, or alkylsilylamide group. Each L is independently selected from: a hydrocarbon; an oxygen-containing hydrocarbon; an amine; a polyamine; a bipyridine; an oxygen containing heterocycle; a nitrogen containing heterocycle; and combinations thereof; and n is an integer ranging from 0 to 4, inclusive.
A metal containing film is deposited onto the substrate, while the substrate is maintained at a temperature between about 100° C. and about 500° C.
281 Citations
22 Claims
-
1. A method for depositing a metal containing thin film on a substrate;
- comprising;
a) introducing a vapor phase metal-organic precursor into a reaction chamber containing one or more substrates, wherein the precursor comprises a compound with at least one β
-diketiminato ligand, and which has the general formula;
M(R1C(NR4)CR2C(NR5)R3)2Lnwherein; M is a metal selected from the group consisting of;
nickel, cobalt, ruthenium, iridium, palladium, platinum, silver and gold;each of R1-5 is an organic ligand independently selected from the group consisting of;
H; and
a C1-C4 linear or branched, alky group, alkylsilyl group, alkylamide group, alkoxide group, or alkylsilylamide group;each L is independently selected from the group consisting of;
a hydrocarbon;
an oxygen-containing hydrocarbon;
an amine;
a polyamine;
a bipyridine;
an oxygen containing heterocycle;
a nitrogen containing heterocycle; and
combinations thereof; andn is an integer ranging from 0 to 4, inclusive; b) depositing a metal containing film onto the substrate, wherein the substrate is maintained at a temperature between about 100°
C. and about 500°
C. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 21, 22)
- comprising;
-
20. A precursor for depositing a metal containing thin film on a substrate, comprising an metal-organic precursor with at least one β
- -diketiminato ligand and which has the general formula;
M(R1C(NR4)CR2C(NR5)R3)2Lnwherein; M is a metal selected from the group consisting of;
nickel, cobalt, ruthenium, iridium, palladium, platinum, silver and gold;each of R1-5 is an organic ligand independently selected from the group consisting of;
H; and
a C1-C4 linear or branched, alky group, alkylsilyl group, alkylamide group, alkoxide group, or alkylsilylamide group;each L is independently selected from the group consisting of;
a hydrocarbon;
an oxygen-containing hydrocarbon;
an amine;
a polyamine;
a bipyridine;
an oxygen containing heterocycle;
a nitrogen containing heterocycle; and
combinations thereof; andn is an integer ranging from 0 to 4, inclusive;
- -diketiminato ligand and which has the general formula;
Specification