Oxide semiconductor transistor and method of manufacturing the same
First Claim
1. An oxide semiconductor thin film transistor (TFT), comprising:
- a channel layer including an oxide semiconductor;
a first gate;
a second gate;
a first gate insulating layer arranged between the channel layer and the first gate; and
a second gate insulating layer arranged between the channel layer and the second gate, wherein the first and second gate insulating layers are comprised of different materials.
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Abstract
An oxide semiconductor thin film transistor (TFT) and a method of manufacturing the oxide semiconductor TFT. The oxide semiconductor TFT includes a first gate insulating layer arranged between an oxide semiconductor channel layer and a first gate and a second gate insulating layer arranged between the channel layer and a second gate. The first and second gate insulating layers are made out of different materials and have different thicknesses. Preferably, the second gate insulating layer is silicon oxide and is thinner than the first gate insulating layer which is preferably silicon nitride. Oxide semiconductor refers to an oxide material such as Zinc Oxide, Tin Oxide, Ga—In—Zn Oxide, In—Zn Oxide, In—Sn Oxide, and one of Zinc Oxide, Tin Oxide, Ga—In—Zn Oxide, In—Zn Oxide and In—Sn Oxide.
206 Citations
35 Claims
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1. An oxide semiconductor thin film transistor (TFT), comprising:
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a channel layer including an oxide semiconductor; a first gate; a second gate; a first gate insulating layer arranged between the channel layer and the first gate; and a second gate insulating layer arranged between the channel layer and the second gate, wherein the first and second gate insulating layers are comprised of different materials. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. An oxide semiconductor TFT, comprising:
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a channel layer including an oxide semiconductor; a first gate; a second gate, a first gate insulating layer arranged between the channel layer and the first gate; and a second gate insulating layer arranged between the channel layer and the second gate, wherein the first and second gate insulating layers have different thicknesses. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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23. A method of manufacturing an oxide semiconductor TFT, comprising:
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forming sequentially a first gate and a first gate insulating layer on a substrate; forming a channel layer comprised of an oxide semiconductor on the first gate insulating layer; forming a second gate insulating layer that covers the channel layer; and forming a second gate on the second gate insulating layer. - View Dependent Claims (24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35)
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Specification