TRENCH TRANSISTOR AND METHOD FOR FABRICATING A TRENCH TRANSISTOR
First Claim
1. A method for producing a trench transistor from a preprocessed semiconductor body, comprising:
- providing a trench structure;
providing a field electrode structure embedded in the trench structure;
wherein the field electrode structure is electrically insulated from the semiconductor body by a field electrode insulation structure by;
depositing insulating material on the field electrode structure;
forming a gate electrode insulation structure; and
forming a gate electrode structure.
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Accused Products
Abstract
A trench transistor having a semiconductor body, in which a trench structure and an electrode structure embedded in the trench structure is disclosed. The electrode structure is electrically insulated from the semiconductor body by an insulation structure. The electrode structure has a gate electrode structure and a field electrode structure arranged below the gate electrode structure and electrically insulated from the latter. There is provided between the gate electrode structure and the field electrode structure a shielding structure for reducing the capacitive coupling between the gate electrode structure and the field electrode structure.
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Citations
15 Claims
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1. A method for producing a trench transistor from a preprocessed semiconductor body, comprising:
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providing a trench structure; providing a field electrode structure embedded in the trench structure; wherein the field electrode structure is electrically insulated from the semiconductor body by a field electrode insulation structure by; depositing insulating material on the field electrode structure; forming a gate electrode insulation structure; and forming a gate electrode structure. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A trench transistor, having a semiconductor body, comprising:
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a trench structure; an electrode structure embedded in the trench structure; the electrode structure being electrically insulated from the semiconductor body by an insulation structure and having a gate electrode structure and a field electrode structure arranged below the gate electrode structure and electrically insulated from the latter; and there being provided between the gate electrode structure and the field electrode structure a shielding structure for reducing the capacitive coupling between the gate electrode structure and the field electrode structure, wherein the shielding structure has a shielding insulation layer, the k value of which is less than the k value of the insulation structure. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14)
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15. A method for producing a trench transistor comprising:
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providing a trench structure; forming a field electrode structure embedded in the trench structure structure; depositing insulating material on the field electrode structure; forming a gate electrode insulation structure; and forming a gate electrode structure; wherein the field electrode structure is electrically insulated from a semiconductor body by a field electrode insulation.
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Specification