COHERENCE-REDUCTION DEVICES AND METHODS FOR PULSED LASERS

• US 20090213350A1
• Filed: 02/16/2009
• Published: 08/27/2009
• Est. Priority Date: 02/22/2008
• Status: Abandoned Application

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Sogard, Michael R.
• Application Number:
  US12/371,887
• Publication Number:
  US 20090213350A1
• Time in Patent Office: Days
• US Class Current: 355/67
• CPC Class Codes: G02B 27/48 Laser speckle optics
• CPC Class Codes: G03B 27/54 Lamp housings; Illuminating means
• CPC Class Codes: G03F 7/70583 Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
• CPC Class Codes: H01S 3/005 Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping shaping laser beam for working metal or other materials B23K26/06; optical elements, systems or apparatus in general G02B

Abstract

Devices and methods are disclosed for reducing coherence, and thus speckle, of a coherent beam of light. An exemplary illumination device includes a source emitting a pulsed coherent light beam having a transverse spatial coherence length. A deflector positioned in the path spatially displaces a first portion of a beam pulse from a second portion of the beam pulse, where the second portion is later in time than the first portion. A diffuser situated in the path receives the first portion of the beam pulse on a first region of the diffuser and the second portion of the beam pulse on a second region of the diffuser, such that the first and second regions are separated by a distance at least equal to the transverse spatial coherence length.

Claims

1. An illumination device, comprising:

a source emitting a pulsed coherent light beam along a path, the beam having a transverse spatial coherence length and comprising multiple beam pulses;

a deflector positioned in the path and configured to spatially displace a first portion of a beam pulse from a second portion of the beam pulse, the second portion being later in time than the first portion; and

a diffuser situated in the path and configured to receive the first portion of the beam pulse on a first region of the diffuser and the second portion of the beam pulse on a second region of the diffuser, such that the first and second regions are separated by a distance at least equal to the transverse spatial coherence length.

2. The device of claim 1, further comprising a scan-amplifier situated between the deflector and the diffuser.

3. The device of claim 2, wherein the scan-amplifier comprises a near-confocal resonator cavity or a second deflector.

4. The device of claim 3, wherein:

the scan-amplifier comprises a second deflector; and

the second deflector comprises a moving mirror or electro-optical deflector.

5. The device of claim 1, wherein the deflector comprises an electro-optic deflector or moving mirror.

6. The device of claim 5, further comprising a scan-amplifier situated between the deflector and the diffuser.

7. The device of claim 6, wherein the scan-amplifier comprises a near-confocal resonator cavity or a second deflector.

8. The device of claim 1, wherein:

the deflector comprises a moving mirror impinged by the beam; and

the device further comprises a scan-amplifier situated between the deflector and the diffuser.

9. The device of claim 1, wherein the deflector comprises multiple moving mirrors impinged by the beam.

10. The device of claim 9, further comprising a scan-amplifier situated between the deflector and the diffuser.

11. The device of claim 1, wherein the deflector is configured to pass the laser beam multiple times through the deflector.

12. The device of claim 1, further comprising a wavelength-conversion system situated downstream of the source and upstream of the diffuser.

13. The device of claim 12, wherein the wavelength-conversion system is situated between the deflector and the diffuser.

14. The device of claim 1, wherein;

the diffuser is a first diffuser situated upstream of the deflector; and

the device further comprises a second diffuser situated downstream of the deflector.

15. The device of claim 1, further comprising an illumination-optical system downstream of the diffuser.

16. A device for producing a laser beam exhibiting reduced speckle, the device comprising:

a laser source emitting a pulsed laser beam along a path, the laser beam having a transverse spatial coherence length and comprising multiple beam pulses;

a deflector positioned in the path and configured to spatially displace a first portion of a beam pulse from a second portion of the beam pulse, the second portion being later in time than the first portion; and

a diffuser situated in the path and configured to receive the first portion of the beam pulse on a first region of the diffuser and the second portion of the beam pulse on a second region of the diffuser, such that the first and second regions are separated by a distance at least equal to the transverse spatial coherence length.

17. A device for reducing speckle in a pulsed laser beam having a transverse spatial coherence length, the device comprising:

a deflector positioned to receive beam pulses of the laser beam, the deflector being configured to spatially displace a first portion of a beam pulse from a second portion of the beam pulse, the second portion being later in time than the first portion; and

a diffuser situated and configured to receive the first portion of the beam pulse on a first region of the diffuser and the second portion of the beam pulse on a second region of the diffuser, such that the first and second regions are separated by a distance at least equal to the transverse spatial coherence length.

18. An illumination-optical system, comprising:

a laser source emitting a pulsed laser beam along a path, the laser beam having a transverse spatial coherence length and comprising multiple beam pulses;

a deflector positioned in the path and configured to spatially displace a first portion of a beam pulse from a second portion of the beam pulse, the second portion being later in time than the first portion; and

a diffuser situated in the path and configured to receive the first portion of the beam pulse on a first region of the diffuser and the second portion of the beam pulse on a second region of the diffuser, such that the first and second regions are separated by a distance at least equal to the transverse spatial coherence length.

19. The system of claim 18, further comprising at least one optical element located downstream of the diffuser.

20. A microlithography system, comprising:

an illumination system including (a) a laser source emitting a pulsed laser beam having a transverse spatial coherence length and comprising multiple beam pulses, (b) a deflector situated and configured to spatially displace a first portion of a beam pulse from a second portion of the beam pulse, the second portion being later in time than the first portion, and (c) a diffuser situated and configured to receive the first portion of the beam pulse on a first region of the diffuser and the second portion of the beam pulse on a second region of the diffuser, such that the first and second regions are separated by a distance at least equal to the transverse spatial coherence length; and

an imaging-optical system situated downstream of the illumination system.

21. An illumination device, comprising:

a laser source emitting a pulsed laser beam along a path, the beam having a transverse spatial coherence length and comprising at least one pulse having a pulse length;

a deflector positioned in the path and configured to deflect, at an angular velocity, pulses of the laser beam; and

a diffuser situated to receive deflected pulses from the deflector;

wherein the deflector moves the pulses across the diffuser at a velocity of motion related to the angular velocity, the velocity of motion is such that a mathematical product of the pulse length and the velocity of motion is at least as large as the transverse spatial coherence length.

22. The device of claim 21, wherein the deflector is an electro-optic deflector.

23. The device of claim 21, further comprising a scan-amplification system.

24. A microlithography system, comprising an illumination device as recited in claim 21.

25. A method for reducing speckle in a pulsed laser beam, comprising:

scanning a pulsed laser beam, having a transverse spatial coherence length and comprising at least one pulse with a pulse length, across a diffuser at a velocity of motion that is such that a mathematical product of the pulse length and the velocity of motion is at least as large as the transverse spatial coherence length; and

diffusing the scanned pulsed laser beam.

26. The method of claim 25, further comprising, before diffusing the scanned beam, amplifying an angle at which the pulsed laser beam is scanned

27. An illumination device, comprising:

a source means for emitting pulses of a pulsed laser beam, the pulsed laser beam having a transverse spatial coherence length;

displacement means for receiving the pulses and, with respect to a pulse, for spatially displacing a beginning portion of the pulse from a latter portion of the pulse; and

diffusing means including means for diffusing the beginning portion of the beam pulse and means for diffusing the latter portion of the beam pulse, the means for diffusing the beginning portion and the means for diffusing the latter portion being separated by a distance that is at least as long as the transverse spatial coherence length.