Lithographic Apparatus and Device Manufacturing Method

• US 20090213353A1
• Filed: 03/27/2009
• Published: 08/27/2009
• Est. Priority Date: 02/18/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Bleeker, Arno Jan, Gui, Cheng-Qun, De Jager, Pieter Willem Herman
• Granted Patent: US 7,911,586 B2
• Time in Patent Office: Days
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70283 Mask effects on the imaging process
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70308 Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

Abstract

Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.

Claims

1. An apparatus comprising:

(i) an array of individually controllable elements to receive and pattern a projection beam of radiation; and

(ii) an array of focusing elements comprising at least two focus elements, each being optically associated with a separate group of the individually controllable elements;

wherein each of the individually controllable elements can be set to at least two states in which a corresponding portion of the patterned projection beam provides radiation at an intensity between the at least two states.