Exposure apparatus and device manufacturing method
First Claim
1. An exposure apparatus that exposes a substrate mounted on a movable substrate stage with a pattern via a projection optical system, comprising:
- a measurement stage being movable independent of the substrate stage; and
a position detector that directs a beam to a reflection member provided on the measurement stage and detects the position of the measurement stage, whereinan aerial image measuring instrument that measures an aerial image projected using the projection optical system and a reference mark for measurement of the positional relationship of the substrate stage with respect to the projection image of the pattern are disposed adjacent to the reflection member of the measurement stage.
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Accused Products
Abstract
An exposure apparatus equipped with a measurement stage that is provided with various measuring instruments disposed in a relationship wherein measurement accuracy is not lowered, and a device manufacturing method using the exposure apparatus are provided. An exposure apparatus according to the present invention is equipped with a measurement stage provided independent of a wafer stage that holds a wafer, On a measurement table (MTB) held on the upper face of this measurement stage, a reference plate (53) on which a first reference mark (FM1) being used for an aerial image measuring instrument and a second reference mark (FM2) for measuring the positional relationship of the wafer stage with respect to the projection image of the pattern of a reticle are formed is provided. This reference plate (53) and the aerial image measuring instrument are disposed adjacent to a reflection surface (51X) to which the beam from an X-axis interferometer is projected and a reflection surface (50) to which the beam from a Y-axis interferometer is projected.
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Citations
27 Claims
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1. An exposure apparatus that exposes a substrate mounted on a movable substrate stage with a pattern via a projection optical system, comprising:
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a measurement stage being movable independent of the substrate stage; and a position detector that directs a beam to a reflection member provided on the measurement stage and detects the position of the measurement stage, wherein an aerial image measuring instrument that measures an aerial image projected using the projection optical system and a reference mark for measurement of the positional relationship of the substrate stage with respect to the projection image of the pattern are disposed adjacent to the reflection member of the measurement stage. - View Dependent Claims (2, 3, 4, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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5. An exposure apparatus that exposes a substrate mounted on a movable substrate stage with a pattern via a projection optical system, comprising:
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a measurement stage being movable independent of the substrate stage; a detector that is provided on the measurement stage and detects information regarding exposure energy; and a position detector that directs a beam to a reflection member provided on the measurement stage and detects the position of the measurement stage, wherein an aerial image measuring instrument that measures an aerial image projected using the projection optical system is disposed on the measurement stage closer to the reflection member than the detector. - View Dependent Claims (16, 18, 20, 22, 24, 26)
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6. An exposure apparatus that exposes a substrate mounted on a movable substrate stage with a pattern via a projection optical system, comprising:
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a measurement stage being movable independent of the substrate stage; an aberration detector that is provided on the measurement stage and detects the aberration information of the projection optical system; and a position detector that directs a beam to the reflection member provided on the measurement stage and detects the position of the measurement stage, wherein an aerial image measuring instrument that measures an aerial image projected using the projection optical system is disposed on the measurement stage closer to the reflection member than the aberration detector. - View Dependent Claims (17, 19, 21, 23, 25, 27)
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Specification