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Exposure apparatus and device manufacturing method

  • US 20090213357A1
  • Filed: 09/07/2005
  • Published: 08/27/2009
  • Est. Priority Date: 10/08/2004
  • Status: Abandoned Application
First Claim
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1. An exposure apparatus that exposes a substrate mounted on a movable substrate stage with a pattern via a projection optical system, comprising:

  • a measurement stage being movable independent of the substrate stage; and

    a position detector that directs a beam to a reflection member provided on the measurement stage and detects the position of the measurement stage, whereinan aerial image measuring instrument that measures an aerial image projected using the projection optical system and a reference mark for measurement of the positional relationship of the substrate stage with respect to the projection image of the pattern are disposed adjacent to the reflection member of the measurement stage.

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