×

OXIDIZING AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES

  • US 20090215658A1
  • Filed: 10/04/2006
  • Published: 08/27/2009
  • Est. Priority Date: 10/05/2005
  • Status: Active Grant
First Claim
Patent Images

1. An aqueous cleaning composition, comprising at least one oxidizing agent, at least one oxidizing agent stabilizer comprising an amine species selected from the group consisting of primary amines, secondary amines, tertiary amines and amine-N-oxides, optionally at least one organic co-solvent, optionally at least one metal-chelating agent, optionally at least one buffering species, and water, wherein said aqueous cleaning composition is suitable for cleaning post-plasma etch residue and/or hardmask material from a microelectronic device having said residue and/or hardmask thereon.

View all claims
  • 9 Assignments
Timeline View
Assignment View
    ×
    ×