Lithographic Apparatus and Device Manufacturing Method with Radiation Beam Inspection
First Claim
1. A lithographic apparatus, comprising:
- a patterning system configured to provide a patterned radiation beam;
a projection system configured to project the patterned radiation beam onto a target portion of a substrate; and
a radiation beam inspection device comprising a sensor and a reflecting device and configured to inspect at least a part of the patterned radiation beam,wherein in a substrate exposure position, the projection system is configured to expose a pattern of radiation on the substrate using the patterned radiation beam and the radiation beam inspection device is configured to move the reflecting device away from a light path of the patterned radiation beam, andwherein in a radiation beam inspection position, the radiation beam inspection device is configured to move the reflecting device into the light path of the patterned radiation beam, thereby directing the patterned radiation beam towards the sensor.
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Accused Products
Abstract
A lithographic apparatus can include the following devices: a patterning system, a projection system, and a radiation beam inspection device. The patterning system can be configured to provide a patterned radiation beam. The projection system can be configured to project the patterned radiation beam onto a target portion of a substrate. Further, the radiation beam inspection device can be configured to inspect at least a part of the patterned radiation beam. In a substrate exposure position, the projection system is configured to expose a pattern of radiation on the substrate using the patterned radiation beam and the radiation beam device is configured to move the reflecting device away from a light path of the patterned radiation beam. In a radiation beam inspection position, the radiation beam inspection device is configured to move the reflecting device into the light path of the patterned radiation beam.
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Citations
20 Claims
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1. A lithographic apparatus, comprising:
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a patterning system configured to provide a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate; and a radiation beam inspection device comprising a sensor and a reflecting device and configured to inspect at least a part of the patterned radiation beam, wherein in a substrate exposure position, the projection system is configured to expose a pattern of radiation on the substrate using the patterned radiation beam and the radiation beam inspection device is configured to move the reflecting device away from a light path of the patterned radiation beam, and wherein in a radiation beam inspection position, the radiation beam inspection device is configured to move the reflecting device into the light path of the patterned radiation beam, thereby directing the patterned radiation beam towards the sensor. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method of optimizing operation of a lithographic apparatus for formation of a device on a substrate, the method comprising:
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moving a reflecting device into an exposure light path to direct a patterned beam of radiation onto a radiation beam inspection device, wherein the radiation beam inspection device is configured to inspect the pattern of radiation that would be exposed on the substrate that is along the exposure light path; determining at least one modification to an operation of the lithographic apparatus to minimize a difference between a required pattern to be exposed on the substrate and the pattern determined by the radiation beam inspection device; and projecting a modified patterned radiation beam onto the substrate, after moving the reflecting device out of the exposure light path, with the at least one modification used to produce the modified patterned radiation beam. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20)
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Specification