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Lithographic Apparatus and Device Manufacturing Method with Radiation Beam Inspection

  • US 20090219500A1
  • Filed: 05/07/2009
  • Published: 09/03/2009
  • Est. Priority Date: 08/31/2005
  • Status: Active Grant
First Claim
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1. A lithographic apparatus, comprising:

  • a patterning system configured to provide a patterned radiation beam;

    a projection system configured to project the patterned radiation beam onto a target portion of a substrate; and

    a radiation beam inspection device comprising a sensor and a reflecting device and configured to inspect at least a part of the patterned radiation beam,wherein in a substrate exposure position, the projection system is configured to expose a pattern of radiation on the substrate using the patterned radiation beam and the radiation beam inspection device is configured to move the reflecting device away from a light path of the patterned radiation beam, andwherein in a radiation beam inspection position, the radiation beam inspection device is configured to move the reflecting device into the light path of the patterned radiation beam, thereby directing the patterned radiation beam towards the sensor.

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