Tetraorganoammonium and tetraorganophosphonium salts for acid gas scrubbing process

• US 20090220399A1
• Filed: 07/21/2006
• Published: 09/03/2009
• Est. Priority Date: 08/09/2005
• Status: Abandoned Application

• Current Assignee: Frank Cheng-Yu Wang, Michael Siskin
• Original Assignee: Frank Cheng-Yu Wang, Michael Siskin
• Inventors: Siskin, Michael, Wang, Frank Cheng-Yu
• Application Number:
  US11/989,155
• Publication Number:
  US 20090220399A1
• Time in Patent Office: Days
• US Class Current: 423/223
• CPC Class Codes: B01D 2257/304 Hydrogen sulfide
• CPC Class Codes: B01D 2258/00 Sources of waste gases
• CPC Class Codes: B01D 2258/06 Polluted air
• CPC Class Codes: B01D 53/1468 Removing hydrogen sulfide
• CPC Class Codes: B01D 53/1493 Selection of liquid materials for use as absorbents
• CPC Class Codes: C07F 9/5407 Acyclic saturated phosphonium compounds

Abstract

Tetraorganoammonium and tetraorganophosphonium salts are useful as absorbents for the selective removal of acidic components from mixtures of said acidic components and CO₂.

Claims

1. A process for the selective removal of one or more gaseous acidic components from a normally gaseous mixture containing said gaseous acidic components and gaseous CO₂ comprising contacting said normally gaseous mixture with an absorbent amino- and/or phosphino compound comprising one or more of tetraorganoammonium salt, one or more of tetraorgano phosphonium salt or a mixture of one or more tetraorganoammonium salt(s) and one or more tetraorganophosphonium salt(s) under conditions whereby one or more gaseous acidic components is selectively absorbed from said mixture.

2. The process of claim 1 wherein the tetraorgano-ammonium salts are of the formula:

[R₄N]⁺X⁻

and the tetraorganophosphorium salts are of the formula;

[R₄P]⁺X⁻

wherein X is hydroxide, carbonate, R¹COO⁻

, ArCOO⁻

wherein R¹ is H, C_1-9 substituted or unsubstituted alkyl C₃-C₉ substituted or unsubstituted alkenyl, branched alkyl, branched alkenyl, cycloalkyl, C₃-C₉ substituted or unsubstituted hydroxy alkyl or hydroxy cycloalkyl, Ar is C₆ to C₁₄ aryl or alkylaryl or arylalkyl radical and R is the same or different and selected from C₁-C₂₀ substituted or unsubstituted alkyl, C₂-C₂₀ substituted or unsubstituted alkenyl, C₃-C₂₀ substituted or unsubstituted branched chain alkyl, alkenyl, cyclic, cycloalkyl, cycloalkenyl, C₆-C₂₀ substituted or unsubstituted aryl, alkylaryl, arylalkyl, the substitutents, if present, being oxygen containing functional groups.

3. The process of claim 2 wherein the oxygen containing functional group is —

OH, —

R²OH, —

OR³, —

R²—

O—

R³,

4. The process of claim 1, 2 or 3 wherein the gaseous acidic component selectively absorbed from the mixture is H₂S.

5. An absorbent comprising one or more tetraorgano ammonium salt(s), tetraorgano phosphonium salt(s) or mixture thereof.

6. The absorbent of claim 5 wherein the tetraorgano ammonium salts are of the formula

[R₄N]⁺X⁻

and the tetraorganophosphorium salts are of the formula;

[R₄P]⁺X⁻

wherein X is hydroxide, carbonate, R¹COO⁻

, ArCOO⁻

wherein R¹ is H, C_1-9 substituted or unsubstituted alkyl C₃-C₉ substituted or unsubstituted alkenyl, branched alkyl, branched alkenyl, cycloalkyl, C₃-C₉ substituted or unsubstituted hydroxy alkyl or hydroxy cycloalkyl, Ar is C₆ to C₁₄ aryl or alkylaryl or arylalkyl radical and R is the same or different and selected from C₁-C₂₀ substituted or unsubstituted alkyl, C₂-C₂₀ substituted or unsubstituted alkenyl, C₃-C₂₀ substituted or unsubstituted branched chain alkyl, alkenyl, cyclic, cycloalkyl, cycloalkenyl, C₆-C₂₀ substituted or unsubstituted aryl, alkylaryl, arylalkyl, the substitutents, if present, being oxygen containing functional group(s).

7. The absorbent of claim 6 wherein the oxygen containing functional group is —

OH, —

R²OH, —

OR³, —

R²—

O—

R³,