INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS
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Accused Products
Abstract
An inductively coupled plasma processing apparatus (100) comprises a plasma chamber (12) with a dielectric window (400) forming a self-supporting wall element of the plasma chamber (12). The dielectric window (400) has an external and an internal side with respect to the chamber (12). An electromagnetic field source (140) is arranged in front of the external side of the dielectric window (400) for generating an electromagnetic field within the plasma chamber (12). The field source comprises at least one magnetic core (301, 302, 303). The at least one magnetic core (301, 302, 303) is attached to the external side of the dielectric window (400), such that the at least one magnetic core helps the dielectric window (400) to withstand collapsing forces caused by negative pressure inside said chamber during operation.
117 Citations
34 Claims
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1-13. -13. (canceled)
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14. Inductively coupled plasma processing apparatus comprising:
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a plasma chamber with a field admission aperture and a dielectric window forming a self-supporting wall element of said plasma chamber that is closing and sealing in a gastight manner said field admission aperture, said dielectric window having an external and an internal side with respect to said chamber; and an electromagnetic field source arranged in front of said external side of said dielectric window for generating an electromagnetic field within said plasma chamber, said field source comprising a plurality of separate magnetic cores;
whereinsaid magnetic cores are arranged on the external side of said dielectric window with adjacent side faces or with a separator of dielectric material arranged between two magnetic cores, such that said arrangement covers said dielectric window, and each of said magnetic cores and separators is attached to said external side of said dielectric window by means of a thin layer of bonding agent, such that they help said dielectric window to withstand collapsing forces caused by negative pressure inside said chamber during operation. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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27. Inductively coupled plasma processing apparatus comprising:
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a plasma chamber with a field admission aperture, a rim portion and a dielectric window having an internal and an external side with respect to said chamber, said dielectric window forming a wall element of said plasma chamber and being flanged with the border of its internal side to said rim portion of said plasma chamber so as to have a gas-tight sealing function for said field admission aperture; and an electromagnetic field source arranged in front of said external side of said dielectric window for generating an electromagnetic field within said plasma chamber, said field source comprising a plurality of separate magnetic cores;
whereineach magnetic core is attached immediately to the external side of said dielectric window by means of a bonding agent, such that said magnetic cores help said dielectric window to withstand collapsing forces caused by negative pressure inside said chamber during operation; and at least one separator of dielectric material is arranged between at least two of said plurality of separate magnetic cores and is attached to the external side of said dielectric window, so that it is directly supported by said dielectric window and contributes to form a mechanical reinforcement of the latter. - View Dependent Claims (28, 29, 30, 31, 32, 33, 34)
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Specification