Exposure Apparatus, Exposure Method, and Device Manufacturing Method
First Claim
1. An exposure apparatus that exposes a substrate via an optical member and a liquid, comprising:
- a substrate holding member that is movable while holding the substrate;
a first immersion mechanism that fills a space between the optical member and the substrate holding member with a liquid;
a movable member that can be disposed in place of the substrate holding member at opposing the optical member while retaining with the optical member the liquid therebetween;
a measuring device that has a measuring member, which is disposed on the movable member, and that carries out a specific measurement when the measuring member is disposed opposite the optical member with the liquid held therebetween; and
a second immersion mechanism that forms an immersion region on the measuring member at least when the movable member has moved away from the optical member.
1 Assignment
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Accused Products
Abstract
An exposure apparatus (EX) includes: a substrate stage (ST1) that is movable while holding substrate (P); a first immersion mechanism (1) that fills an optical path space (K1) between a final optical member (LS1) and the substrate stage (ST1) with a liquid (LQ) when the substrate stage (ST1) is disposed opposite the final optical member (LS1) that is closest to the image plane of the projection optical system (PL); a measurement stage (ST2) in which the optical path space (K1) with the final optical member (LS1) is filled with the liquid (LQ) when the measurement stage (ST2) is disposed in place of the substrate stage (ST1) opposite the final optical member (LS1) in the projection optical system; a measuring device (60) that has an upper plate (65) that is disposed on the measurement stage (ST2), and that carries out specific measurements when the upper plate (65) is disposed opposite the final optical member (LS1) of the projection optical system with the liquid (LQ) held therebetween; and a second immersion mechanism (2) that forms an immersion region (LR2) on the upper plate (65) at least when the measurement stage (ST2) has moved away from the final optical member (LS1) in the projection optical system.
35 Citations
28 Claims
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1. An exposure apparatus that exposes a substrate via an optical member and a liquid, comprising:
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a substrate holding member that is movable while holding the substrate; a first immersion mechanism that fills a space between the optical member and the substrate holding member with a liquid; a movable member that can be disposed in place of the substrate holding member at opposing the optical member while retaining with the optical member the liquid therebetween; a measuring device that has a measuring member, which is disposed on the movable member, and that carries out a specific measurement when the measuring member is disposed opposite the optical member with the liquid held therebetween; and a second immersion mechanism that forms an immersion region on the measuring member at least when the movable member has moved away from the optical member. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 20)
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14. An exposure apparatus that exposes a substrate via an optical member and a liquid, comprising:
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a first movable member that holds the substrate; a first immersion mechanism that forms a first immersion region by filling a space between the optical member and the first movable member with a liquid; a second movable member that can be disposed in place of the first movable member at opposing the optical member while retaining with the optical member the first immersion region therebetween, and that has a measuring member within the surface of contact with the liquid; and a second immersion mechanism that forms a second immersion region on the measuring member that is in contact with the liquid at a different position from that of the first immersion mechanism. - View Dependent Claims (15, 16, 17, 18, 19)
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21. An exposure method for exposing a substrate via an optical member and a liquid, the method comprising:
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forming a first liquid immersion region by filling a space between the optical member and a first movable member that holds the substrate, with a liquid, and exposing the substrate via the optical member and the liquid; disposing a second movable member in place of the first movable member at opposing the optical member while maintaining with the optical member the first immersion region therebetween; and forming a second immersion region on top of the measuring member after the measuring member of the second movable member has come into contact with the liquid. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28)
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Specification