×

Exposure Apparatus, Exposure Method, and Device Manufacturing Method

  • US 20090226846A1
  • Filed: 03/30/2006
  • Published: 09/10/2009
  • Est. Priority Date: 03/30/2005
  • Status: Abandoned Application
First Claim
Patent Images

1. An exposure apparatus that exposes a substrate via an optical member and a liquid, comprising:

  • a substrate holding member that is movable while holding the substrate;

    a first immersion mechanism that fills a space between the optical member and the substrate holding member with a liquid;

    a movable member that can be disposed in place of the substrate holding member at opposing the optical member while retaining with the optical member the liquid therebetween;

    a measuring device that has a measuring member, which is disposed on the movable member, and that carries out a specific measurement when the measuring member is disposed opposite the optical member with the liquid held therebetween; and

    a second immersion mechanism that forms an immersion region on the measuring member at least when the movable member has moved away from the optical member.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×