Generation of pattern data with no overlapping or excessive distance between adjacent patterns
First Claim
1. A device for generating pattern data for unevenness that is randomly arranged on a reflecting surface, said device comprising:
- a coordinate displacement device that generates a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between patterns, wherein the limitation on the arrangement of patterns includes limiting pattern arrangement according to a relationship between a basic pitch, a movable range and a pattern unit dimension; and
a pattern generator that arranges said patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement device to generate the pattern data for unevenness that is randomly arranged on the reflecting surface.
2 Assignments
0 Petitions
Accused Products
Abstract
A device is disclosed for generating pattern data for unevenness that is randomly arranged on the surface of the reflective substrate of a reflective liquid crystal display device. The number of coordinates, a basic pitch, a movable range, and a dot diameter are entered from a data entry unit. An array generation unit regularly arranges base coordinates in two dimensions in accordance with the basic pitch. Coordinate displacement unit randomly displaces within the movable range at a portion of the basic coordinates to generate a multiplicity of displaced coordinates. Pattern generation unit arranges dot patterns with the dot diameter entered at each of the displaced coordinates generated to generate pattern data.
26 Citations
44 Claims
-
1. A device for generating pattern data for unevenness that is randomly arranged on a reflecting surface, said device comprising:
-
a coordinate displacement device that generates a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between patterns, wherein the limitation on the arrangement of patterns includes limiting pattern arrangement according to a relationship between a basic pitch, a movable range and a pattern unit dimension; and a pattern generator that arranges said patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement device to generate the pattern data for unevenness that is randomly arranged on the reflecting surface. - View Dependent Claims (2, 3, 4, 5, 7, 8, 10, 12, 14, 43, 44)
-
-
6. (canceled)
-
9. (canceled)
-
11. (canceled)
-
13. (canceled)
-
15. A computer-readable storage medium storing a computer program for causing a computer to execute processes for generating pattern data for unevenness that is randomly arranged on a reflecting surface, said computer program comprising executable code that provides:
-
a first command set for entering a basic pitch, a movable range, and a a pattern unit dimension; a second command set for regularly arranging a multiplicity of base coordinates in two dimensions in accordance with said basic pitch entered by said first command set; a third command set for randomly displacing within said movable range at least a portion of said base coordinates arranged by said second command set; and a fourth command set for arranging patterns with said pattern unit dimension according to at least a portion of the multiplicity of said displaced coordinates generated by said third command set, wherein the patterns are arranged according to a pattern arrangement limitation to prevent overlap or excessive distance between patterns, wherein the pattern arrangement limitation includes limiting pattern arrangement according to a relationship between the basic pitch, the movable range and the pattern unit dimension. - View Dependent Claims (35, 36, 37, 38, 39, 40, 41, 42)
-
-
16-34. -34. (canceled)
Specification