METHOD FOR MANUFACTURING SHOWER PLATE, SHOWER PLATE MANUFACTURED USING THE METHOD, AND PLASMA PROCESSING APPARATUS INCLUDING THE SHOWER PLATE

• US 20090229753A1
• Filed: 03/12/2009
• Published: 09/17/2009
• Est. Priority Date: 03/12/2008
• Status: Abandoned Application

• Current Assignee: Tohoku University National Universities Corporation, Tokyo Electron Limited
• Original Assignee: Tohoku University National Universities Corporation, Tokyo Electron Limited
• Inventors: OHMI, Tadahiro, GOTO, Tetsuya, ISHIBASHI, Kiyotaka
• Application Number:
  US12/402,832
• Publication Number:
  US 20090229753A1
• Time in Patent Office: Days
• US Class Current: 156/345.340
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: C23C 16/45568 Porous nozzles
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01L 21/67069 for drying etching

Abstract

A gas-communicating body 11 having a pillar shape and pores communicated with each other in a gas-communicating direction is formed. A dense member 12 is formed of a material that is not gas-permeable, has a tube shape, and covers a lateral side of the gas-communicating body 11 so that the dense member and the lateral side of the gas-communicating body contact each other. A porous piece body 13 is formed by inserting the gas-communicating body into a hollow portion of the dense member, and then the porous piece body is sintered at a first temperature. A concave portion is formed on a top plate, and a gas flow path penetrating the top plate of which one end is connected to the concave portion is formed. The porous piece body is inserted into the concave portion, and then is entirely sintered at a temperature equal to or lower than the first temperature. Accordingly, the shower plate is formed.

Claims

1. A method for manufacturing a shower plate for introducing gas into a processing container in a plasma processing apparatus, the method comprising:

forming a porous gas-communicating body having a pillar shape with a porous material;

forming a dense member having a tube shape with a dense material that is not gas-permeable;

forming a porous piece body by covering a lateral side of the porous gas-communicating body with the dense member so that the lateral side of the gas-communicating body and the dense member contact each other;

performing a first sintering step by sintering the porous piece body at a first temperature;

forming a concave portion on one of principal surfaces of a dielectric plate, which is to face plasma, wherein the dielectric plate is a main body of the shower plate;

forming a gas flow path from the bottom face of the concave portion to the other of the principal surfaces of the dielectric plate;

inserting the porous piece body into the concave portion; and

performing a second sintering step by entirely sintering the dielectric plate after the inserting step, at a second temperature equal to or lower than the first temperature.

2. The method of claim 1, further comprising pre-sintering step in which the porous gas-communicating body is sintered in advance, before the forming step of the porous piece body.

3. The method of claim 1, wherein in the performing of the first sintering step, sintering conditions are selected such that a sintering shrinkage rate of the dense member is higher than a sintering shrinkage rate of the porous gas-communicating body.

4. The method of claim 1, further comprising individually checking a gas-communicating amount of the porous piece body before the inserting step.

5. The method of claim 1, further comprising chamfering an edge between a surface of the porous piece body contacting the bottom face of the concave portion and a lateral side of the porous piece body, before the inserting step.

6. The method of claim 5, further comprising forming a gas passage connecting the gas flow path and a space of a portion cut off during the chamfering, before the inserting step.

7. A shower plate manufactured according to the method of claim 1.

8. A plasma processing apparatus comprising the shower plate of claim 7.

9. A shower plate for a plasma processing apparatus for forming plasma, the shower plate comprising:

a dielectric plate formed of a dielectric material;

a concave portion formed on one of principal surfaces of the dielectric plate facing the plasma;

a gas flow path formed from the bottom face of the concave portion to the other of the principal surfaces of the dielectric plate;

a porous gas-communicating body having a pillar shape, wherein the porous gas-communicating body is formed of a porous material;

a dense member having a tube shape, wherein the dense member is formed of a dense material that is not gas-permeable; and

a porous piece body installed in the concave portion, wherein the dense member covers a side of the porous gas-communicating body, so as for the dense member and the side of the porous gas-communicating body to contact each other, and thus is integrated with the porous gas-communicating body,

wherein a gap between the porous gas-communicating body and the dense member, and a gap between the side of the concave portion and the porous piece body are smaller than a maximum pore size in the porous gas-communicating body.

10. The shower plate of claim 9, wherein the maximum pore size is equal to or smaller than about 0.1 mm.

11. The shower plate of claim 9, wherein the porous gas-communicating body does not contact the concave portion.

12. A plasma processing apparatus comprising the shower plate of claim 9.