SHOWER HEAD AND SUBSTRATE PROCESSING APPARATUS
First Claim
1. A shower head provided in a processing chamber for processing a substrate therein, the shower head having a facing surface facing a mounting table for mounting thereon the substrate and serving to supply one or more gases through the facing surface toward the substrate, the shower head comprising:
- a central gas supply unit for supplying a first gas through a central portion of the facing surface toward the substrate;
a peripheral gas supply unit for supplying a second gas through a peripheral portion of the facing surface toward the substrate; and
a gas exhaust unit, provided with a plurality of gas exhaust holes formed between the central and the peripheral gas supply unit, for exhausting the first and the second gas from the facing surface.
1 Assignment
0 Petitions
Accused Products
Abstract
A shower head is provided in a processing chamber for processing a substrate therein. Further, the shower head has a facing surface facing a mounting table for mounting thereon the substrate and serves to supply one or more gases through the facing surface toward the substrate. The shower head includes a central gas supply unit for supplying a first gas through a central portion of the facing surface toward the substrate, a peripheral gas supply unit for supplying a second gas through a peripheral portion of the facing surface toward the substrate and a gas exhaust unit, provided with a plurality of gas exhaust holes formed between the central gas supply unit and the peripheral gas supply unit, for exhausting the first and the second gas from the facing surface.
42 Citations
8 Claims
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1. A shower head provided in a processing chamber for processing a substrate therein, the shower head having a facing surface facing a mounting table for mounting thereon the substrate and serving to supply one or more gases through the facing surface toward the substrate, the shower head comprising:
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a central gas supply unit for supplying a first gas through a central portion of the facing surface toward the substrate; a peripheral gas supply unit for supplying a second gas through a peripheral portion of the facing surface toward the substrate; and a gas exhaust unit, provided with a plurality of gas exhaust holes formed between the central and the peripheral gas supply unit, for exhausting the first and the second gas from the facing surface. - View Dependent Claims (2, 3)
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4. A substrate processing apparatus comprising:
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a processing chamber for processing a substrate therein; a mounting table provided in the processing chamber for mounting thereon the substrate; and a shower head having a facing surface facing the mounting table and serving to supply one or more gases in a shower head through the facing surface to the substrate, wherein the shower head includes; a central gas supply unit for supplying a first gas through a central portion of the facing surface toward the substrate; a peripheral gas supply unit for supplying a second gas through a peripheral portion of the facing surface toward the substrate; and a gas exhaust unit, provided with a plurality of gas exhaust holes formed between the central and the peripheral gas supply unit, for exhausting the first and the second gas from the facing surface. - View Dependent Claims (5, 6, 7, 8)
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Specification