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SHOWER HEAD AND SUBSTRATE PROCESSING APPARATUS

  • US 20090229754A1
  • Filed: 03/13/2009
  • Published: 09/17/2009
  • Est. Priority Date: 03/14/2008
  • Status: Active Grant
First Claim
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1. A shower head provided in a processing chamber for processing a substrate therein, the shower head having a facing surface facing a mounting table for mounting thereon the substrate and serving to supply one or more gases through the facing surface toward the substrate, the shower head comprising:

  • a central gas supply unit for supplying a first gas through a central portion of the facing surface toward the substrate;

    a peripheral gas supply unit for supplying a second gas through a peripheral portion of the facing surface toward the substrate; and

    a gas exhaust unit, provided with a plurality of gas exhaust holes formed between the central and the peripheral gas supply unit, for exhausting the first and the second gas from the facing surface.

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