Microfluid Chip Cleaning
First Claim
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1. A method of cleaning a microfluidic chip comprising at least one microstructure containing a material, wherein the method comprisesremoving the material from the at least one microstructure so as to at least partly empty the at least one microstructure,wherein the removing comprises at least one of:
- heating the microfluidic chip;
irradiating the microfluidic chip with at least one of ultrasonic waves, electromagnetic radiation, and radioactive radiation;
chemically oxidizing the material to be removed from the at least one microstructure.
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Abstract
A method of cleaning a microfluidic chip (101) comprising at least one microstructure (105, 106) containing a material (111), wherein the method comprises removing the material (111) from the at least one microstructure (105, 106) so as to at least partly empty the at least one microstructure (105, 106).
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Citations
11 Claims
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1. A method of cleaning a microfluidic chip comprising at least one microstructure containing a material, wherein the method comprises
removing the material from the at least one microstructure so as to at least partly empty the at least one microstructure, wherein the removing comprises at least one of: -
heating the microfluidic chip; irradiating the microfluidic chip with at least one of ultrasonic waves, electromagnetic radiation, and radioactive radiation; chemically oxidizing the material to be removed from the at least one microstructure. - View Dependent Claims (2, 3, 4, 5, 6)
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7. An apparatus for cleaning a microfluidic chip comprising at least one microstructure containing a material, wherein the apparatus comprises
a removing unit adapted for removing the material from the at least one microstructure so as to at least partly empty the at least one microstructure, wherein the removing comprises at least one of the following: -
heating the microfluidic chip; irradiating the microfluidic chip with at least one of ultrasonic waves, electromagnetic radiation, and radioactive radiation; chemically oxidizing the material to be removed from the at least one microstructure.
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8. A microfluidic chip, comprising
a substrate; -
at least one microstructure formed on and/or in the substrate; wherein the at least one microstructure is cleaned at least partly from remnant material removed from the at least one microstructure so as to at least partly empty the at least one microstructure, wherein the removing of the remnant material is provided by at least one of the following; heating the microfluidic chip; irradiating the microfluidic chip with at least one of ultrasonic waves, electromagnetic radiation, and radioactive radiation; chemically oxidizing the material to be removed from the at least one microstructure. - View Dependent Claims (9, 10, 11)
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Specification