Deposition Method and Manufacturing Method of Light-Emitting Device
First Claim
1. A deposition method comprising the steps of:
- providing a first substrate having a first light absorption layer having metal nitride and a material layer which is formed so as to be in contact with the first light absorption layer on a first surface of the first substrate, and a second light absorption layer on a second surface opposite to the first surface of the first substrate;
making the first surface of the first substrate and a deposition target surface of a second substrate face to each other; and
depositing part of the material layer on the deposition target surface of the second substrate in such a manner that irradiation with laser light having a repetition rate of greater than or equal to 10 MHz and a pulse width of greater than or equal to 100 fs and less than or equal to 10 ns is performed in a direction from the second surface of the first substrate to the first surface of the first substrate through the first substrate to selectively heat part of the material layer which overlaps with the first light absorption layer.
1 Assignment
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Accused Products
Abstract
A first substrate including, on one of surfaces, a light absorption layer having metal nitride and a material layer which is formed so as to be in contact with the light absorption layer is provided; the surface of the first substrate on which the material layer is formed and a deposition target surface of a second substrate are disposed to face each other; and part of the material layer is deposited on the deposition target surface of the second substrate in such a manner that irradiation with laser light having a repetition rate of greater than or equal to 10 MHz and a pulse width of greater than or equal to 100 fs and less than or equal to 10 ns is performed from the other surface side of the first substrate to selectively heat part of the material layer which overlaps with the light absorption layer.
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Citations
23 Claims
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1. A deposition method comprising the steps of:
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providing a first substrate having a first light absorption layer having metal nitride and a material layer which is formed so as to be in contact with the first light absorption layer on a first surface of the first substrate, and a second light absorption layer on a second surface opposite to the first surface of the first substrate; making the first surface of the first substrate and a deposition target surface of a second substrate face to each other; and depositing part of the material layer on the deposition target surface of the second substrate in such a manner that irradiation with laser light having a repetition rate of greater than or equal to 10 MHz and a pulse width of greater than or equal to 100 fs and less than or equal to 10 ns is performed in a direction from the second surface of the first substrate to the first surface of the first substrate through the first substrate to selectively heat part of the material layer which overlaps with the first light absorption layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A deposition method comprising the steps of:
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providing a first substrate having a light absorption layer having chromium nitride and a material layer which is formed so as to be in contact with the light absorption layer on a first surface of the first substrate; making the first surface of the first substrate and a deposition target surface of a second substrate face to each other; and depositing part of the material layer on the deposition target surface of the second substrate in such a manner that irradiation with laser light having a repetition rate of greater than or equal to 10 MHz and a pulse width of greater than or equal to 100 fs and less than or equal to 10 ns is performed in a direction from a second surface opposite to the first surface of the first substrate to the first surface of the first substrate through the first substrate to selectively heat part of the material layer which overlaps with the light absorption layer. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
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Specification