HOLDING APPARATUS, POSITION DETECTION APPARATUS AND EXPOSURE APPARATUS, MOVING METHOD, POSITION DETECTION METHOD, EXPOSURE METHOD, ADJUSTMENT METHOD OF DETECTION SYSTEM AND DEVICE MANUFACTURING METHOD

• US 20090233234A1
• Filed: 05/07/2009
• Published: 09/17/2009
• Est. Priority Date: 11/09/2006
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Shibazaki, Yuichi
• Granted Patent: US 8,432,534 B2
• Time in Patent Office: Days
• US Class Current: 430/296
• CPC Class Codes: G03F 7/70816 Bearings
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Abstract

By a force generation device which can generate a magnetic attraction and gas static pressure between a detection system provided on a lower surface side of an FIA surface plate and a surface plate, a predetermined clearance is formed between the detection system and the surface plate, and in a state where the clearance is formed (a floating state), the detection system is driven by a drive device in at least an uniaxial direction within a horizontal plane. Therefore, because the detection system is in a non-contact state to the base platform, movement (positioning) of the detection system with high precision becomes possible. Further, by setting an attraction larger than a repulsion generated by the force generation device, the detection system can be fixed (landed) in a state positioned with high precision.

Claims

1. A holding apparatus that movably holds a detection system which detects a mark on an object, the apparatus comprising:

a support device which supports the detection system; and

a drive device which drives the detection system supported via a predetermined clearance by the support device at least in a uniaxial direction in a horizontal plane.

2. The holding apparatus according to claim 1 wherein

the support device includes a force generation device which generates an attraction to the detection system, and the attraction supports the detection system by suspension.

3. The holding apparatus according to claim 2 wherein

the support device makes the clearance be approximately zero at a time when the detection system is fixed.

4. The holding apparatus according to claim 3 wherein

the support device forms the clearance by adjusting a force with the detection system at a time of the drive.

5. The holding apparatus according to claim 2 wherein

the force generation device generates a repulsion with the detection system, and the support device adjusts at least one of the attraction and the repulsion to form the clearance.

6. The holding apparatus according to claim 5 wherein

the support device makes the repulsion be approximately zero at a time when the detection system is fixed.

7. The holding apparatus according to claim 5 wherein

the attraction and repulsion generated with the detection system substantially acts on the same position of the detection system.

8. The holding apparatus according to claim 5, the apparatus further comprising:

a controller which controls the drive device to maintain a position of the detection system within a horizontal plane substantially constants during a time the repulsion is reduced to near zero while the attraction of the force generation device is generated.

9. The holding apparatus according to claim 2 wherein

the force generation device generates a magnetic attraction as an attraction with the detection system.

10. The holding apparatus according to claim 9 wherein

the force generation device has a magnetic material member which is provided in at least one of a fixed portion of the support device and the detection system, and a magnet member provided in the other of the fixed portion and the detection system.

11. The holding apparatus according to claim 2 wherein

the force generation device includes a static gas bearing as the repulsion generating device which generates a repulsion with the detection system.

12. The holding apparatus according to claim 11 wherein

the static gas bearing is arranged on the detection system.

13. The holding apparatus according to claim 12 wherein

gas is supplied to the static gas bearing via a fixed portion of the support device on which the detection system is placed.

14. The holding apparatus according to claim 12 wherein

the static gas bearing is arranged at three places of a predetermined plane of the detection system that faces the fixed portion of the support device.

15. The holding apparatus according to claim 2 wherein

the force generation device has a plurality of permanent magnets arranged in the detection system as an attraction generation device which generates an attraction with the detection system and also has a plurality of air pads arranged in the detection system as a repulsion generation device which generates a repulsion with the detection system, whereby

a centroid of a figure which is formed connecting positions of the plurality of permanent magnets and a centroid of a figure formed by connecting positions of the plurality of air pads substantially coincide with each other.

16. The holding apparatus according to claim 1 wherein

the support device supports the detection system by suspension and includes a force generation device which can generate forces in directions opposite to each other in a vertical direction with the detection system, and the clearance is maintained by both of the forces in directions opposite to each other at least during the drive.

17. The holding apparatus according to claim 16 wherein

the support device adjusts at least one of the forces in directions opposite to each other to form the clearance.

18. The holding apparatus according to claim 16 wherein

the support device makes the clearance be approximately zero at a time when the detection system is fixed.

19. The holding apparatus according to claim 16 wherein

the attraction and repulsion generated with the detection system substantially acts on the same position of the detection system.

20. The holding apparatus according to claim 16, the apparatus further comprising:

a controller which controls the drive device to maintain a position of the detection system within a horizontal plane substantially constant, during a time the repulsion is reduced to near zero while the attraction of the force generation device is generated.

21. The holding apparatus according to claim 16 wherein

the force generation device generates a magnetic attraction as an attraction with the detection system.

22. The holding apparatus according to claim 21 wherein

the force generation device has a magnetic material member which is provided in at least one of a fixed portion of the support device and the detection system, and a magnet member provided in the other of the fixed portion and the detection system.

23. The holding apparatus according to claim 16 wherein

the force generation device includes a static gas bearing as the repulsion generating device which generates a repulsion with the detection system.

24. The holding apparatus according to claim 23 wherein

the static gas bearing is arranged on the detection system.

25. The holding apparatus according to claim 24 wherein

gas is supplied to the static gas bearing via a fixed portion of the support device on which the detection system is placed.

26. The holding apparatus according to claim 24 wherein

the static gas bearing is arranged at three places of a predetermined plane of the detection system that faces the fixed portion of the support device.

27. The holding apparatus according to claim 16 wherein

the force generation device has a plurality of permanent magnets arranged in the detection system as an attraction generation device which generates an attraction with the detection system and also has a plurality of air pads arranged in the detection system as a repulsion generation device which generates a repulsion with the detection system, whereby

a centroid of a figure which is formed connecting positions of the plurality of permanent magnets and a centroid of a figure formed by connecting positions of the plurality of air pads substantially coincide with each other.

28. The holding apparatus according to claim 1 wherein

the support device includes a surface plate on which the detection system is placed on a surface side substantially parallel to the horizontal plane, and force generation device which can generate an attraction and a repulsion between the surface plate and the detection system.

29. The holding apparatus according to claim 28 wherein

the force generation device can adjust a magnitude of at least one of the attraction and the repulsion.

30. The holding apparatus according to claim 28 wherein

the clearance is maintained between the detection system and the surface plate by a balance of the attraction and the repulsion generated by the force generation device.

31. The holding apparatus according to claim 28 wherein

the detection system is placed on the lower surface side with respect to the surface plate.

32. The holding apparatus according to claim 28 wherein

the force generation device includes an attraction generation device which generates an attraction between the surface plate and the detection system, and a repulsion generation device which generates a repulsion between the surface plate and the detection system.

33. The holding apparatus according to claim 28 wherein

the support device makes the clearance be approximately zero at a time when the detection system is fixed.

34. The holding apparatus according to claim 28 wherein

the attraction and repulsion generated with the detection system substantially acts on the same position of the detection system.

35. The holding apparatus according to claim 28, the apparatus further comprising:

a controller which controls the drive device to maintain a position of the detection system within a horizontal plane substantially constant, during a time the repulsion is reduced to near zero while the attraction of the force generation device is generated.

36. The holding apparatus according to claim 28 wherein

the force generation device generates a magnetic attraction as an attraction with the detection system.

37. The holding apparatus according to claim 36 wherein

the force generation device has a magnetic material member which is provided in at least one of a fixed portion of the support device and the detection system, and a magnet member provided in the other of the fixed portion and the detection system.

38. The holding apparatus according to claim 28 wherein

the force generation device includes a static gas bearing as the repulsion generating device which generates a repulsion with the detection system.

39. The holding apparatus according to claim 38 wherein

the static gas bearing is arranged on the detection system.

40. The holding apparatus according to claim 39 wherein

gas is supplied to the static gas bearing via a fixed portion of the support device on which the detection system is placed.

41. The holding apparatus according to claim 39 wherein

the static gas bearing is arranged at three places of a predetermined plane of the detection system that faces the fixed portion of the support device.

42. The holding apparatus according to claim 28 wherein

the force generation device has a plurality of permanent magnets arranged in the detection system as an attraction generation device which generates an attraction with the detection system and also has a plurality of air pads arranged in the detection system as a repulsion generation device which generates a repulsion with the detection system, whereby

a centroid of a figure which is formed connecting positions of the plurality of permanent magnets and a centroid of a figure formed by connecting positions of the plurality of air pads substantially coincide with each other.

43. The holding apparatus according to claim 1, the apparatus further comprising:

a restriction member which restricts movement of the detection system within the horizontal plane.

44. The holding apparatus according to claim 43 wherein

the restriction member includes a cam follower shaped stopper member.

45. The holding apparatus according to claim 1, the apparatus further comprising:

a measurement system which measures positional information of the detection system within the horizontal plane.

46. The holding apparatus according to claim 45 wherein

the measurement system includes a linear encoder.

47. The holding apparatus according to claim 1 wherein

the fixed portion of the support device on which the detection system is arranged has a pipe line inside through which a cooling medium passes.

48. The holding apparatus according to claim 1 wherein

the drive device moves an optical system of the detection system, and makes a position of a detection area of the detection system variable.

49. A position detection apparatus, the apparatus comprising:

a detection system which detects a mark on an object; and

a holding apparatus according to claim 1 which movably holds the detection system.

50. An exposure apparatus that forms a pattern on a sensitive object by an irradiation of an energy beam, the apparatus comprising:

the position detection apparatus according to claim 49 which detects positional information of a mark on the sensitive object; and

a patterning device which irradiates the energy beam on the sensitive object using detection results by the position detection apparatus.

51. The exposure apparatus according to claim 50 wherein

the position detection apparatus has a plurality of detection systems which has at least one detection system moved by the drive device, and the plurality of detection systems detects positional information of the mark on the sensitive object.

52. The exposure apparatus according to claim 51 wherein

the drive device moves the at least one detection system so that different marks on the sensitive object can be simultaneously detected by at least two of the plurality of detection systems.

53. A device manufacturing method, the method including:

exposing a sensitive object using the exposure apparatus according to claims 50; and

developing the sensitive object which has been exposed.

54. An exposure method in which a pattern is formed on an object by an irradiation of an energy beam, the method comprising:

a detection process in which positional information of a mark of the sensitive object is detected, using a detection system which is movably held by the holding apparatus according to claim 1; and

a pattern formation process in which the energy beam is irradiated on the sensitive object using the detection results, and a pattern is formed on the sensitive object.

55. The exposure method according to claim 54 wherein

a plurality of detection systems including at least one of the detection system is provided, and a mark of the sensitive object can be detected by the plurality of detection systems.

56. The exposure method according to claim 55 wherein

the at least one detection system is moved so that different marks on the sensitive object can be simultaneously detected by at least two of the plurality of detection systems.

57. A device manufacturing method, the method including:

exposing a sensitive object using the exposure method according to claim 54; and

developing the sensitive object which has been exposed.

58. A position detection apparatus which detects positional information of a mark on an object, the apparatus comprising:

a detection system which detects a mark on the object;

a force generation device which can generate an attraction and a repulsion between the detection system and a fixed portion; and

a drive device which drives the detection system at least uniaxially in the horizontal plane, in a state where a predetermined clearance is formed between the detection system and the fixed portion by the attraction and the repulsion generated by the force generation device.

59. The position detection apparatus according to claim 58 wherein

the force generation device can adjust a magnitude of at least one of the attraction and the repulsion.

60. The position detection apparatus according to claim 58 wherein

in the detection system, at least an optical system is supported by suspension by the fixed portion, and by the drive device moving the optical system, a position of a detection area of the detection system becomes variable.

61. An exposure apparatus that forms a pattern on a sensitive object by an irradiation of an energy beam, the apparatus comprising:

the position detection apparatus according to claim 58 which detects positional information of a mark on the sensitive object; and

a patterning device which irradiates the energy beam on the sensitive object using detection results by the position detection apparatus.

62. The exposure apparatus according to claim 61 wherein

the position detection apparatus has a plurality of detection systems which has at least one detection system moved by the drive device, and the plurality of detection systems detects positional information of the mark on the sensitive object.

63. The exposure apparatus according to claim 62 wherein

the drive device moves the at least one detection system so that different marks on the sensitive object can be simultaneously detected by at least two of the plurality of detection systems.

64. A device manufacturing method, the method including:

exposing a sensitive object using the exposure apparatus according to claim 61; and

developing the sensitive object which has been exposed.

65. A moving method to move a detection system which detects a mark on an object in a horizontal plane, the method comprising:

forming a predetermined clearance between the detection system and a fixed portion by an attraction and a repulsion generated between the detection system and the fixed portion; and

moving the detection system in a horizontal plane, while maintaining the clearance.

66. The moving method according to claim 65, further comprising:

fixing the detection system, which has been moved, to the fixed portion, by adjusting at least one of the attraction and the repulsion and reducing the clearance almost to zero.

67. The moving method according to claim 66 wherein

the repulsion is almost zero at a time when the detection system is fixed.

68. The moving method according to claim 65 wherein

in the detection system, at least an optical system is supported by suspension by the fixed portion, and by moving the optical system, a position of a detection area of the detection system becomes variable.

69. A position detection method in which positional information of a mark on an object is detected, the method comprising:

moving the detection system using the moving method according to claim 65; and

detecting a mark on the object by the detection system which has been moved.

70. An exposure method in which a pattern is formed on a sensitive object by an irradiation of an energy beam, the method comprising:

a detection process in which positional information of a mark on the sensitive object is detected by moving the detection system by the moving method according to claim 65; and

a pattern formation process in which the energy beam is irradiated on the sensitive object using the detection results, and a pattern is formed on the sensitive object.

71. The exposure method according to claim 70 wherein

a plurality of detection systems including at least one of the detection system is provided, and a mark of the sensitive object can be detected by the plurality of detection systems.

72. The exposure method according to claim 71 wherein

the at least one detection system is moved so that different marks on the sensitive object can be simultaneously detected by at least two of the plurality of detection systems.

73. A device manufacturing method, the method including:

exposing a sensitive object using the exposure method according to claim 70; and

developing the sensitive object which has been exposed.

74. A moving method to move a detection system which detects a mark on an object in a horizontal plane, the method comprising:

a switch-off process in which power supply of a measurement system used to measure a position of the detection system in the horizontal plane is switched off in a state where the detection system is positioned at a predetermined position within the horizontal plane;

a storing process in which a measurement value of the measurement system just before switching off the power supply is stored; and

a setting process in which on moving the detection system from a state positioned at the predetermined position, power supply of the measurement system is switched on prior to the moving, and the measurement value is set as an initial value of the measurement system.

75. A position detection method in which positional information of a mark on an object is detected, the method comprising:

moving the detection system using the moving method according to claim 74; and

detecting a mark on the object by the detection system which has been moved.

76. An exposure method in which a pattern is formed on a sensitive object by an irradiation of an energy beam, the method comprising:

a detection process in which positional information of a mark on the sensitive object is detected by moving the detection system by the moving method according to claim 74; and

a pattern formation process in which the energy beam is irradiated on the sensitive object using the detection results, and a pattern is formed on the sensitive object.

77. The exposure method according to claim 76 wherein

a plurality of detection systems including at least one of the detection system is provided, and a mark of the sensitive object can be detected by the plurality of detection systems.

78. The exposure method according to claim 77 wherein

the at least one detection system is moved so that different marks on the sensitive object can be simultaneously detected by at least two of the plurality of detection systems.

79. A device manufacturing method, the method including:

exposing a sensitive object using the exposure method according to claim 76; and

developing the sensitive object which has been exposed.

80. A moving method to move a detection system which detects a mark on an object in a horizontal plane, the method comprising:

a measurement process in which positional information of a mark member and a detection system in the horizontal plane is measured moving the mark member and the detection system in a uniaxial direction within the horizontal plane so that a mark of the mark member is maintained within a detection area of the detection system; and

a movement process in which the detection system is moved in the uniaxial direction, using the positional information which has been measured.

81. The moving method according to claim 80 wherein

in the measurement process, a position of the mark within the detection area during the movement is maintained almost constant.

82. The moving method according to claim 80 wherein

in the movement process, positional information of the mark within the detection area during the movement in the measurement process is used.

83. The moving method according to claim 80 wherein

the mark member includes one of the object and a movable body which moves the object.

84. The moving method according to claim 80 wherein

in the measurement process, the mark member and the detection system are moved continuously.

85. The moving method according to claim 80 wherein

in the measurement process, the mark member and the detection system are moved intermittently.

86. A position detection method in which positional information of a mark on an object is detected, the method comprising:

moving the detection system using the moving method according to claim 80; and

detecting a mark on the object by the detection system which has been moved.

87. An exposure method in which a pattern is formed on a sensitive object by an irradiation of an energy beam, the method comprising:

a detection process in which positional information of a mark on the sensitive object is detected by moving the detection system by the moving method according to claim 80; and

a pattern formation process in which the energy beam is irradiated on the sensitive object using the detection results, and a pattern is formed on the sensitive object.

88. The exposure method according to claim 87 wherein

a plurality of detection systems including at least one of the detection system is provided, and a mark of the sensitive object can be detected by the plurality of detection systems.

89. The exposure method according to claim 88 wherein

the at least one detection system is moved so that different marks on the sensitive object can be simultaneously detected by at least two of the plurality of detection systems.

90. A device manufacturing method, the method including:

exposing a sensitive object using the exposure method according to claim 87; and

developing the sensitive object which has been exposed.

91. An adjustment method of a detection system which detects a mark on an object and is movable at least in a horizontal plane, the method comprising:

a first process in which the detection system is moved to a predetermined movement limit position in a uniaxial direction within the horizontal plane by a drive device which drives the detection system by electromagnetic interaction in the horizontal plane;

a second process in which magnetic pole alignment of the drive device is performed at the movement limit position;

a third process in which the detection system is moved by the drive device approximately to the center of a movement range of the detection system in the unilateral direction;

a fourth process in which the drive device moves the detection system to a predetermined movement limit position related to one side of the other axis direction which intersects the uniaxial direction; and

a fifth process in which an origin search of a measurement device measuring the positional information of the detection system in the uniaxial direction is performed, while moving the detection system from the movement limit position on one side of the other axis direction to the other side of the other axis direction.

92. The adjustment method of a detection system according to claim 91 wherein

the detection system, which are two systems, are arranged in the other axis direction spaced apart by a predetermined distance, and

each one of the processes is performed alternately for each detection system, and in the fourth process, one of the detection system is moved to the movement limit position on one side of the other axis direction, and then in the other detection system, the system is moved to the movement limit position on the other side.