Exposure apparatus, device manufacturing method, maintenance method, and exposure method

• US 20090244503A1
• Filed: 06/04/2009
• Published: 10/01/2009
• Est. Priority Date: 02/10/2004
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Shiraishi, Kenichi
• Granted Patent: US 8,115,902 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041

Abstract

An exposure apparatus can prevent disadvantages of supplying liquid of reduced cleanliness and formation of watermarks. The exposure apparatus exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid, and includes a liquid supply mechanism for supplying the liquid, and a measuring device which measures a time during which the supply of the liquid from the liquid supply mechanism is stopped.

Claims

1. An exposure apparatus which exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid, comprising:

a liquid supply system that supplies the liquid; and

a measuring device which measures a time during which the supply of the liquid from the liquid supply system is stopped.