Exposure apparatus, device manufacturing method, maintenance method, and exposure method
First Claim
Patent Images
1. An exposure apparatus which exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid, comprising:
- a liquid supply system that supplies the liquid; and
a measuring device which measures a time during which the supply of the liquid from the liquid supply system is stopped.
0 Assignments
0 Petitions
Accused Products
Abstract
An exposure apparatus can prevent disadvantages of supplying liquid of reduced cleanliness and formation of watermarks. The exposure apparatus exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid, and includes a liquid supply mechanism for supplying the liquid, and a measuring device which measures a time during which the supply of the liquid from the liquid supply mechanism is stopped.
-
Citations
1 Claim
-
1. An exposure apparatus which exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid, comprising:
-
a liquid supply system that supplies the liquid; and a measuring device which measures a time during which the supply of the liquid from the liquid supply system is stopped.
-
Specification