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SEMICONDUCTOR DEVICE, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, DISPLAY DEVICE, AND MANUFACTURING METHOD OF DISPLAY DEVICE

  • US 20090250695A1
  • Filed: 04/06/2009
  • Published: 10/08/2009
  • Est. Priority Date: 04/04/2008
  • Status: Active Grant
First Claim
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1. A semiconductor device comprising a substrate and a semiconductor layer having a channel region, wherein:

  • the channel region comprises an oxide semiconductor which satisfies Vc/Va>

    4 where Vc is a volume ratio of a crystalline component and Va is a volume ratio of a non-crystalline component.

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