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METHOD FOR FORMING A COMPOUND SEMI-CONDUCTOR THIN-FILM

  • US 20090250722A1
  • Filed: 04/02/2008
  • Published: 10/08/2009
  • Est. Priority Date: 04/02/2008
  • Status: Active Grant
First Claim
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1. A method of fabricating a thin-film semiconductor device, comprising:

  • providing a plurality of raw semiconductor materials;

    pre-reacting the raw semiconductor materials to form a homogeneous compound semiconductor target material; and

    depositing the compound semiconductor target material onto a substrate to form a thin-film having a composition substantially the same as a composition of the compound semiconductor target material.

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