Exposure Apparatus, Exposure Method, and Method for Producing Device

• US 20090253083A1
• Filed: 03/31/2006
• Published: 10/08/2009
• Est. Priority Date: 03/31/2005
• Status: Abandoned Application

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Nagasaka, Hiroyuki
• Application Number:
  US11/887,565
• Publication Number:
  US 20090253083A1
• Time in Patent Office: Days
• US Class Current: 430/325
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041

Abstract

An exposure apparatus includes a liquid supply unit which supplies a liquid to fill an optical path space for an exposure light beam therewith, a first land surface which is opposed to a surface of a substrate arranged at an exposure position and which surrounds the optical path space for the exposure light beam, and second land surfaces which are arranged outside the first land surface. The first land surface is capable of retaining the liquid between the surface of the substrate and the first land surface. The second land surface is provided to make no contact with a film of the liquid existing between the second land surface and the surface of the substrate. Accordingly, the exposure apparatus is provided, in which the optical path space for the exposure light beam can be filled with the liquid in a desired state even when the exposure is performed while moving the substrate.

Claims

1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate, the exposure apparatus comprising:

a liquid supply unit which supplies a liquid to fill an optical path space for the exposure light beam with the liquid;

a first surface which is provided to surround the optical path space for the exposure light beam, which is arranged opposite to a surface of an object arranged at a position capable of being irradiated with the exposure light beam, and between which and the object the liquid supplied from the liquid supply unit can be retained; and

a second surface which is provided outside the first surface with respect to the optical path space for the exposure light beam, and which is arranged opposite to the surface of the object, wherein;

the second surface is provided to prevent a film of the liquid, which exists between the surface of the object and the second surface, from making contact with the second surface.

2. The exposure apparatus according to claim 1, wherein:

the first surface is arranged while being away from the surface of the object by a first spacing distance; and

the second surface is provided so that the liquid, which exists between the surface of the object and the second surface, forms the film to be thinner than the first spacing distance.

3. The exposure apparatus according to claim 1, wherein the second surface is provided so that the liquid, which has been in contact with the first surface, is separated from the second surface when an interface of the liquid between the surface of the object and the first surface is moved toward outside of the first surface with respect to the optical path space for the exposure light beam.

4. The exposure apparatus according to claim 1, wherein:

the first surface is provided substantially in parallel to the surface of the object; and

the second surface is away farther from the surface of the object as compared with the first surface.

5. The exposure apparatus according to claim 1, wherein:

the first surface is provided substantially in parallel to the surface of the object, and the first surface is liquid-attractive with respect to the liquid; and

the second surface is liquid-repellent with respect to the liquid.

6. The exposure apparatus according to claim 1, wherein:

the exposure light beam is radiated onto the substrate while moving the substrate in a predetermined direction; and

the second surface is provided on each side of the first surface in the predetermined direction.

7. The exposure apparatus according to claim 6, wherein an outer shape of the first surface is a rectangular shape in which a direction intersecting the predetermined direction is a longitudinal direction.

8. The exposure apparatus according to claim 6, wherein a size of the second surface in the predetermined direction is set depending on a movement velocity of the substrate when the substrate is exposed.

9. The exposure apparatus according to claim 6, wherein a size of the second surface in the predetermined direction is set depending on a contact angle between the substrate and the liquid.

10. The exposure apparatus according to claim 1, further comprising a recovery port which recovers the liquid and which is disposed outside the second surface with respect to the optical path space.

11. The exposure apparatus according to claim 10, wherein the recovery port is provided at a position opposite to the object.

12. The exposure apparatus according to claim 10, wherein the recovery port is provided to surround the first surface and the second surface.

13. The exposure apparatus according to claim 10, wherein a position of an edge of the first surface and a position of the recovery port are set so that the film of the liquid, which is generated at a boundary between the first surface and the second surface, is formed inside the recovery port with respect to the optical path space for the exposure light beam.

14. The exposure apparatus according to claim 10, further comprising a predetermined member which is provided at the recovery port and which makes contact with the liquid.

15. The exposure apparatus according to claim 14, wherein the predetermined member includes a porous member.

16. The exposure apparatus according to claim 15, wherein a distance between the porous member and the object is substantially equal to a distance between the first surface and the surface of the object.

17. The exposure apparatus according to claim 14, wherein the predetermined member includes a fin-shaped member.

18. The exposure apparatus according to claim 10, further comprising a wall portion which is provided at a circumferential edge portion of the recovery port and which prevents a leakage of the liquid.

19. The exposure apparatus according to claim 1, further comprising:

an optical member through which the exposure light beam passes;

a third surface which is provided to surround the optical path space for the exposure light beam and which is arranged opposite to the optical member via a predetermined gap between the optical member and the third surface; and

a supply port which is provided in the vicinity of a predetermined space disposed between the optical member and the third surface and to which the liquid is supplied from the liquid supply unit.

20. The exposure apparatus according to claim 19, further comprising a gas discharge port which is provided in the vicinity of the predetermined space and which communicates the predetermined space and external space.

21. The exposure apparatus according to claim 1, further comprising:

an optical member through which the exposure light beam passes;

a third surface which is provided to surround the optical path space for the exposure light beam and which is arranged opposite to the optical member via a predetermined gap between the optical member and the third surface; and

a gas discharge port which is provided in the vicinity of a predetermined space disposed between the optical member and the third surface and which communicates the predetermined space and external space.

22. The exposure apparatus according to claim 1, wherein the object includes the substrate.

23. A method for producing a device, comprising:

exposing a substrate by using the exposure apparatus as defined in claim 1;

developing the exposed substrate; and

processing the developed substrate.

24. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:

a member which is opposite to a surface of an object arranged at a position capable of being irradiated with the exposure light beam, and between which and the object the liquid can be retained; and

a recovery section which recovers the liquid retained between the object and the member, wherein a space-forming area, which is positioned to be opposite to the surface of the object and is positioned between an optical path and the recovery section, and which provides a space between the member and the liquid on the object, is formed at the member.

25. The exposure apparatus according to claim 24, wherein the space-forming area is a recess formed on the member.

26. The exposure apparatus according to claim 24, wherein the space-forming area is a liquid-repellent area formed on a surface of the member.

27. The exposure apparatus according to claim 26, wherein a liquid-attractive area is provided between the optical path and the liquid-repellent area of the member.

28. The exposure apparatus according to claim 24, wherein the recovery section is provided at the member.

29. The exposure apparatus according to claim 24, wherein the substrate is moved in a predetermined direction when the exposure light beam is radiated onto the substrate through the liquid, and the space-forming area is provided between the optical path and the recovery section in the predetermined direction.

30. A method for producing a device, comprising:

exposing a substrate by using the exposure apparatus as defined in claim 24;

developing the exposed substrate; and

processing the developed substrate.

31. An exposure method for exposing a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure method comprising:

supplying the liquid to a space between the substrate and a member arranged to be opposite to the substrate;

recovering the liquid while providing a space between the member and the liquid on the substrate; and

exposing the substrate by radiating the exposure light beam onto the substrate through the liquid.

32. The exposure method according to claim 31, further comprising moving the substrate in a predetermined direction when the exposure light beam is radiated onto the substrate through the liquid, wherein the liquid is recovered while the space is provided between the liquid and the member in the predetermined direction.

33. The exposure method according to claim 31, further comprising:

moving the substrate in a predetermined direction, wherein;

the liquid is recovered by the liquid recovery section while providing the space between an optical path space for the exposure light beam in the predetermined direction and the liquid recovery section arranged to be opposite to the substrate.

34. The exposure method according to claim 32, wherein the liquid recovery section is formed at the member.

35. A method for producing a device, comprising:

exposing a substrate by using the exposure method as defined in claim 31;

developing the exposed substrate; and

processing the developed substrate.