Charged Particle Inspection Method and Charged Particle System
First Claim
1. A charged particle inspection method, comprising:
- in a first mode of operation, directing a first number of primary charged particle beamlets onto an object surface, to generate a secondary charged particle beamlet from each of the primary charged particle beamlets incident on the object surface;
directing each of the secondary charged particle beamlets onto a detector arrangement to detect an intensity of each of the secondary charged particle beamlets, wherein a first number of intensities is detected;
in a second mode of operation, directing a second number of the primary charged particle beamlets onto the object surface, wherein the second number is at least one and less than the first number;
directing each of the secondary charged particle beamlets onto the detector arrangement to detect an intensity of each of the secondary charged particle beamlets, wherein a second number of intensities is detected.
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Accused Products
Abstract
The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.
109 Citations
36 Claims
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1. A charged particle inspection method, comprising:
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in a first mode of operation, directing a first number of primary charged particle beamlets onto an object surface, to generate a secondary charged particle beamlet from each of the primary charged particle beamlets incident on the object surface; directing each of the secondary charged particle beamlets onto a detector arrangement to detect an intensity of each of the secondary charged particle beamlets, wherein a first number of intensities is detected; in a second mode of operation, directing a second number of the primary charged particle beamlets onto the object surface, wherein the second number is at least one and less than the first number; directing each of the secondary charged particle beamlets onto the detector arrangement to detect an intensity of each of the secondary charged particle beamlets, wherein a second number of intensities is detected. - View Dependent Claims (2, 3, 4)
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5. A charged particle system comprising:
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at least one charged particle source; a first multi aperture plate disposed downstream of the at least one charged particle source, the first multi aperture plate comprising a plurality of apertures; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate comprising a plurality of apertures; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the at least one charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. - View Dependent Claims (6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A charged particle system, comprising:
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a source of primary charged particle beamlets; a field generating arrangement configured to generate at least one of a magnetic or electrical field extending over a space traversed by beam paths of the primary charged particle beamlets, a beamstop disposed downstream of the field generating arrangement; a controller configured to selectively switch the field generating arrangement from a first mode of operation to a second mode of operation, wherein a first field associated with the first mode of operation is different from a second field associated with the second mode of operation; wherein the field generating arrangement and the beamstop are arranged such that a first number of primary charged particle beamlets bypasses the beamstop when the field generating arrangement is switched to the first mode of operation and such that a second number of primary charged particle beamlets bypasses the beamstop when the field generating arrangement is switched to the second mode of operation, wherein the second number is at least one and less than the first number, and wherein a third number of primary charged particle beamlets is incident on the beamstop when the field generating arrangement is switched to the second mode of operation, wherein the third number is equal to a difference between the first and second numbers. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33)
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34. A particle-optical component for manipulating a plurality of beamlets of charged particles, the particle-optical component comprising:
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a first multi aperture plate comprising a plurality of apertures and a second multi aperture plate comprising a plurality of apertures, the first and second multi aperture plates forming a gap between them, a controller configured to selectively apply at least a first voltage difference between the first and second multi aperture plates to generate at least a first electrical field between them, wherein the first and second multi aperture plates are configured and positioned relative to each other such that the first electrical field generated changes a divergence of a set of charged particle beamlets traversing the particle-optical component upon exit from the particle-optical component. - View Dependent Claims (35, 36)
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Specification