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THIN FILM STRUCTURES WITH NEGATIVE INDUCTANCE AND METHODS FOR FABRICATING INDUCTORS COMPRISING THE SAME

  • US 20090261936A1
  • Filed: 04/21/2009
  • Published: 10/22/2009
  • Est. Priority Date: 04/21/2008
  • Status: Active Grant
First Claim
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1. An inductor comprising a substrate and a planar conductor structure on a surface of the substrate, the planar conductor structure defining a total thickness and comprisinga vertical stack of three or more multilayer films, each multilayer film comprisinga first layer of a first metal, the first layer defining a first vertical thickness, the first metal defining a first composition, the first composition being substantially the same in all multilayer films of the vertical stack;

  • anda second layer of a second metal, the second layer covering the first layer and defining a second vertical thickness, the second metal defining a second composition not equal to the first composition, the second composition being substantially the same in all multilayer films of the vertical stack, the ratio of the first vertical thickness to the second vertical thickness being substantially the same in all multilayer films of the vertical stack;

    a first contact point; and

    a second contact point, wherein the number of multilayers, the first composition, the first vertical thickness, the second composition, and the second vertical thickness all are chosen such that the inductor exhibits a negative electrical self-inductance when an electric signal is transmitted from the first contact point to the second contact point.

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