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MASK TRANSPORT SYSTEM CONFIGURED TO TRANSPORT A MASK INTO AND OUT OF A LITHOGRAPHIC APPARATUS

  • US 20090262327A1
  • Filed: 06/12/2009
  • Published: 10/22/2009
  • Est. Priority Date: 12/27/2002
  • Status: Active Grant
First Claim
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1. A mask transport system configured to transport a mask into and out of a lithographic apparatus, the mask transport system comprising:

  • a first container configured to shield a top side and a bottom side of the mask, at least a portion of the container being at least partially translucent for radiation having a predetermined wavelength used to detect contamination on the top side or the bottom side of the mask when the mask is shielded by the first container; and

    a second container configured to enclose the first container, the second container comprising a first part defining a first opening and an openable cover that covers said first opening, the cover being configured to open and release the first container within the lithographic apparatus or at an interface with the lithographic apparatus.

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