EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
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Abstract
A pattern image generation device generates a pattern image, and at least a part of the pattern image which has been generated or the pattern image which is generated and is formed on an object is photoelectrically detected by a detection system. Then, a correction device corrects design data that should be input to the pattern image generation device based on the detection results. Accordingly, a pattern image is generated on an object by the pattern image generation device corresponding to the input of the design data after the correction, and because the object is exposed using the pattern image, a desired pattern is formed on the object with good precision.
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Citations
38 Claims
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1-24. -24. (canceled)
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25. A device manufacturing method comprising:
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forming a pattern image by using a spatial light modulator to which an illumination light is irradiated, based on data corresponding to a device pattern; detecting the pattern image that has been formed; correcting the device pattern based on a result of the detection; and exposing a substrate with a radiation image of the device pattern that has been corrected. - View Dependent Claims (26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38)
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Specification