SHOWERHEAD FOR CHEMICAL VAPOR DEPOSITION AND CHEMICAL VAPOR DEPOSITION APPARATUS HAVING THE SAME
First Claim
Patent Images
1. A showerhead for chemical vapor deposition comprising:
- a head storing reaction gas flowing thereinto and feeding the stored reaction gas to a reaction chamber; and
at least one support member passing through and coupled with the head and the reaction chamber so as to support the head.
3 Assignments
0 Petitions
Accused Products
Abstract
A showerhead for chemical vapor deposition (CVD) includes a head storing reaction gas flowing thereinto and feeding the stored reaction gas to a reaction chamber, and at least one support member passing through and coupled with the head and the reaction chamber so as to support the head.
-
Citations
19 Claims
-
1. A showerhead for chemical vapor deposition comprising:
-
a head storing reaction gas flowing thereinto and feeding the stored reaction gas to a reaction chamber; and at least one support member passing through and coupled with the head and the reaction chamber so as to support the head. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
-
-
13. A chemical vapor deposition apparatus comprising:
-
a reaction chamber; a head storing reaction gas flowing thereinto and feeding the stored reaction gas to the reaction chamber; and at least one support member passing through and coupled with the head and the reaction chamber so as to support the head. - View Dependent Claims (14, 15, 16, 17, 18, 19)
-
Specification