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SHOWERHEAD FOR CHEMICAL VAPOR DEPOSITION AND CHEMICAL VAPOR DEPOSITION APPARATUS HAVING THE SAME

  • US 20090266911A1
  • Filed: 10/09/2008
  • Published: 10/29/2009
  • Est. Priority Date: 04/24/2008
  • Status: Active Grant
First Claim
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1. A showerhead for chemical vapor deposition comprising:

  • a head storing reaction gas flowing thereinto and feeding the stored reaction gas to a reaction chamber; and

    at least one support member passing through and coupled with the head and the reaction chamber so as to support the head.

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