EXPOSURE APPARATUS, MOVABLE BODY DRIVE SYSTEM, PATTERN FORMATION APPARATUS, AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

• US 20090268178A1
• Filed: 12/29/2008
• Published: 10/29/2009
• Est. Priority Date: 12/28/2007
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Shibazaki, Yuichi
• Granted Patent: US 9,229,333 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70425 Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
• CPC Class Codes: G03F 7/70975 Assembly, maintenance, transport or storage of apparatus
• CPC Class Codes: G03F 9/7088 Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
• CPC Class Codes: G03F 9/7096 Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus
• CPC Class Codes: Y10T 29/49002 Electrical device making

Abstract

While a wafer stage moves linearly in a Y-axis direction, surface position information of a wafer surface at a plurality of detection points set at a predetermined interval in an X-axis direction is detected by a multipoint AF system, and by a plurality of alignment systems arranged in a line along the X-axis direction, marks at different positions on the wafer are each detected, and a part of a chipped shot of the wafer is exposed by a periphery edge exposure system. This allows throughput to be improved when compared with the case when detection operation of the marks, detection operation of the surface position information (focus information), and periphery edge exposure operation are performed independently.

Claims

1. An exposure apparatus that exposes an object with an exposure beam, the apparatus comprising:

a movable body which holds the object and moves along a predetermined plane including a first axis and a second axis orthogonal to each other;

a measurement system which is placed away from an exposure position where the exposure is performed in a direction parallel to the first axis that performs a predetermined measurement of the object; and

a periphery edge exposure system which is placed away from the measurement system in a direction parallel to the first axis that exposes at least some periphery shot areas of the object.

2. The exposure apparatus according to claim 1 wherein

at least a part of an exposure operation by the periphery edge exposure system is performed in parallel with the measurement operation.

3. The exposure apparatus according to claim 1 wherein

the measurement system includes a mark detection system which has a plurality of detection areas whose positions are different in a direction parallel to the second axis.

4. The exposure apparatus according to claim 1 wherein

the measurement system includes a detection device which detects positional information of the object in a direction parallel to a third axis orthogonal to the predetermined plane in a detection area extending in a direction parallel to the second axis or at a plurality of detection points whose positions are different in a direction parallel to the second axis.

5. The exposure apparatus according to claim 1 wherein

the periphery edge exposure system can simultaneously expose at least two places located apart in a direction parallel to the second axis of the object held by the movable body.

6. The exposure apparatus according to claim 1 wherein

the periphery edge exposure system has a plurality of mirror elements placed in the shape of a matrix along a surface parallel to the predetermined plane, and can perform switching of a first state in which the energy beam incident on each mirror element is reflected to a predetermined direction and a second state in which the energy beam is reflected to a direction different from the predetermined direction.

7. The exposure apparatus according to claim 1 wherein

shot areas in the periphery of the object exposed by the periphery edge exposure system is a shot area which has an area partially outside the effective area of the object.

8. The exposure apparatus according to claim 1 wherein

as the movable body, a first and second movable bodies are provided which hold the object and are independently movable within the predetermined plane, and the apparatus further comprises:

a controller which in parallel with exposure of an object held by one of the first and second movable bodies, performs the predetermined measurement of an object held by the other movable body of the first and second movable bodies while moving the other movable body at least in a direction parallel to the first axis, and also controls the periphery edge exposure system and exposes a shot area in the periphery of the object held by the other movable body which passes below the periphery edge exposure system while moving toward the exposure position.

86. A device manufacturing method, including exposing an object using the exposure apparatus according to claim 1;

and

developing the exposed object.

9. -85. (canceled)

87. An exposure apparatus that exposes an object with an exposure beam, the apparatus comprising:

a movable body which holds the object and is movable within a predetermined plane including a first axis and a second axis orthogonal to each other; and

a periphery edge exposure system which is arranged between an exposure position where the exposure is performed and an exchange position of the object placed away from the exposure position in a direction parallel to the first axis, and exposes at least a part of a periphery area which is different from an area on the object where the exposure is performed, wherein

at least a part of an exposure operation of the periphery area is performed in parallel with a movement operation of the movable body from one of the exposure position and the exchange position to the other.

88. The exposure apparatus according to claim 87, the apparatus further comprising:

a measurement system which is placed away from the exposure position in a direction parallel to the first axis, and measures positional information of the object, and

at least a part of an exposure operation of the periphery edge exposure is performed in parallel with the measurement operation.

89. The exposure apparatus according to claim 88 wherein

the measurement system includes a mark detection system which has a plurality of detection areas whose positions are different in a direction parallel to the second axis.

90. The exposure apparatus according to claim 87 wherein

the periphery edge exposure system has a plurality of irradiation areas whose positions are different in a direction parallel to the second axis and are each irradiated with an energy beam that can simultaneously expose different areas of the periphery areas.

91. The exposure apparatus according to claim 87 wherein

as the movable body, a first and second movable bodies which respectively hold an object and are independently movable within the predetermined plane are provided, herein

in parallel with an exposure operation of an object held by one of the first and second movable bodies, exposure of a periphery area of an object held by the other one of the first and second movable bodies is performed.

92. A device manufacturing method, including

exposing an object using the exposure apparatus according to claim 87;

and

developing the exposed object.

93. An exposure apparatus that exposes an object with an energy beam and forms a pattern on the object, the apparatus comprising:

a first movable body which holds an object and moves within a predetermined plane which includes a first axis and a second axis orthogonal to each other;

a second movable body which holds an object and moves independently from the first movable body within the plane;

a mark detection system which has a plurality of detection areas whose positions are different in a direction parallel to the second axis, and detects a mark on the object mounted on each of the first and second movable bodies; and

a controller which detects a plurality of different marks of an object held by the other one of the first and second movable bodies with the mark detection system and measures positional information of the marks, while moving the other one of the movable bodies in a direction parallel to the first axis, in parallel with an exposure performed of an object held by one of the first and second movable bodies.

94. The exposure apparatus according to claim 93 wherein

the apparatus has a two-dimensional grating on each of a surface substantially parallel to the plane of the first and second movable bodies whose periodic direction is in a direction parallel to the first axis and a direction parallel to the second axis, respectively, and a grating section placed in a pair in a direction parallel to the second axis at a predetermined distance whose longitudinal direction is in a direction parallel to the first axis, the apparatus further comprising:

an encoder system which has a first head section having a plurality of two-dimensional heads which are placed at different positions in a direction parallel to the second axis facing the surface substantially parallel to the plane, and measures positional information of one of the movable bodies within the plane, based on measurement values of the heads belonging to the first head section that respectively face the pair of grating sections of the one movable body at the time of exposure of an object held by the one movable body.

95. The exposure apparatus according to claim 94 wherein

the encoder system further has a second head section having a plurality of heads which are placed at different positions in a direction parallel to the second axis facing the surface substantially parallel to the plane, and further measures positional information of the other movable body within the plane, based on measurement values of the heads belonging to the second head section that respectively face the pair of grating sections of the other movable body at the time of mark detection of an object held by the other movable body.

96. The exposure apparatus according to claim 93, the apparatus further comprising:

a periphery edge exposure system which is placed away from the plurality of detection areas in a direction parallel to the first axis, and performs periphery edge exposure in parallel with the mark detection operation of the object.

97. A device manufacturing method, including

exposing an object using the exposure apparatus according to claim 93;

and

developing the exposed object.

98. An exposure apparatus that exposes an object with an energy beam and forms a pattern on the object, the apparatus comprising:

a first movable body which holds an object and moves within a predetermined plane which includes a first axis and a second axis orthogonal to each other;

a second movable body which holds an object and moves independently from the first movable body within the plane;

a planar motor which drives the first and the second movable body within the plane; and

a controller which controls the planar motor, and also moves the first movable body along a first return path located on one side of an exposure position where the exposure is performed in a direction parallel to the second axis to a first exchange position where an object on the first movable body is exchanged when exposure of an object held by the first movable body has been completed, as well as move the second movable body along a second return path located on the other side of an exposure position in a direction parallel to the second axis to a second exchange position where an object on the second movable body is exchanged when exposure of an object held by the second movable body has been completed.

99. The exposure apparatus according to claim 98, the apparatus further comprising:

an optical member which emits the energy beam; and

a liquid immersion device which supplies liquid in a space between the optical member and one of the first and second movable bodies, and forms a liquid immersion area, wherein

the controller controls the first and second movable bodies via the planar motor so that a switching is performed between a proximity state in which the first movable body and the second movable body are made to be in proximity in a direction parallel to the first axis by a predetermined distance or less and a separation state in which both movable bodies are separated, to pass the liquid immersion area from the one movable body to the other movable body after exposure has been completed on an object held by the one movable body.

100. The exposure apparatus according to claim 99 wherein

in the proximity state in which the first movable body and the second movable body are in proximity after exposure of an object held by the first movable body has been completed, the first movable body shifts to one side of the exposure position in a direction parallel to the second axis with respect to the second movable body, and

in the proximity state in which the first movable body and the second movable body are in proximity after exposure of an object held by the second movable body has been completed, the second movable body shifts to the other side of the exposure position in a direction parallel to the second axis with respect to the first movable body.

101. The exposure apparatus according to claim 98 wherein

the apparatus has a two-dimensional grating on each of a surface substantially parallel to the plane of the first and second movable bodies whose periodic direction is in a direction parallel to the first axis and a direction parallel to the second axis, respectively, and a grating section placed in a pair in a direction parallel to the second axis at a predetermined distance whose longitudinal direction is in a direction parallel to the first axis, the apparatus further comprising:

an encoder system which has a first head section having a plurality of two-dimensional heads which are placed at different positions in a direction parallel to the second axis facing the surface substantially parallel to the plane in the vicinity of an exposure position where the exposure was performed, and measures positional information of the one movable body within the plane in the vicinity of the exposure position, based on measurement values of the two-dimensional heads belonging to the first head section that respectively face the pair of grating sections of the one movable body which holds the object subject to exposure.

102. The exposure apparatus according to claim 101, the apparatus further comprising:

a mark detection system which is placed away from an exposure position where the exposure is performed in a direction parallel to the first axis, and has a plurality of detection areas whose positions are different in a direction parallel to the second axis, wherein

the encoder system further has a second head section having a plurality of heads which are placed at different positions in a direction parallel to the second axis facing the surface substantially parallel to the plane in the vicinity of the plurality of detection areas, and further measures positional information of the other movable body within the plane, based on measurement values of the two-dimensional heads belonging to the second head section that respectively face the pair of grating sections of the other movable body in the vicinity of the plurality of detection areas.

103. A device manufacturing method, including

exposing an object using the exposure apparatus according to claim 98;

and

developing the exposed object.

104. An exposure apparatus that exposes an object with an energy beam and forms a pattern on the object, the apparatus comprising:

a first movable body which holds an object and moves within a predetermined plane which includes a first axis and a second axis orthogonal to each other;

a second movable body which holds an object and moves independently from the first movable body within the plane;

a planar motor which drives the first and the second movable body within the plane;

an optical member which emits the energy beam;

a liquid immersion device which supplies liquid in a space between the optical member and one of the first and second movable bodies, and forms a liquid immersion area; and

a controller which controls the planar motor so as to perform a switching between a proximity state in which the first movable body and the second movable body are made to be in proximity in a direction parallel to the first axis by a predetermined distance or less and a separation state in which both movable bodies are separated so as to pass the liquid immersion area from the one movable body to the other movable body, after exposure has been completed on an object held by the one movable body, and to move the one movable body separated from the other movable body along a return path positioned on one side of the exposure position in a direction parallel to the second axis to an exchange position where an object on the first and second movable bodies are exchanged.

105. The exposure apparatus according to claim 104 wherein

in the proximity state, the one movable body is shifted to the one side in a direction parallel to the second axis with respect to the other movable body.

106. The exposure apparatus according to claim 104 wherein

the apparatus has a two-dimensional grating on each of a surface substantially parallel to the plane of the first and second movable bodies whose periodic direction is in a direction parallel to the first axis and a direction parallel to the second axis, respectively, and a grating section placed in a pair in a direction parallel to the second axis at a predetermined distance whose longitudinal direction is in a direction parallel to the first axis, the apparatus further comprising:

an encoder system which has a first head section having a plurality of two-dimensional heads which are placed at different positions in a direction parallel to the second axis facing the surface substantially parallel to the plane in the vicinity of an exposure position where the exposure was performed, and measures positional information of the one movable body within the plane in the vicinity of the exposure position, based on measurement values of the two-dimensional heads belonging to the first head section that respectively face the pair of grating sections of the one movable body which holds the object subject to exposure.

107. The exposure apparatus according to claim 106, the apparatus further comprising:

a mark detection system which is placed away from an exposure position where the exposure is performed in a direction parallel to the first axis, and has a plurality of detection areas whose positions are different in a direction parallel to the second axis, wherein

the encoder system further has a second head section having a plurality of heads which are placed at different positions in a direction parallel to the second axis facing the surface substantially parallel to the plane in the vicinity of the plurality of detection areas, and further measures positional information of the other movable body within the plane, based on measurement values of the two-dimensional heads belonging to the second head section that respectively face the pair of grating sections of the other movable body in the vicinity of the plurality of detection areas.

108. A device manufacturing method, including

exposing an object using the exposure apparatus according to claim 104;

and

developing the exposed object.

109. A movable body drive system which drives a movable body substantially along a predetermined plane, the system comprising:

an encoder system which has a head irradiating a detection beam on a scale having a two-dimensional grating whose periodic directions are a first and second direction orthogonal to each other within a plane parallel to the predetermined plane and receiving light from the scale, and measures positional information of the movable body at least in directions of two degrees of freedom within the predetermined plane including the first and second directions based on measurement values of the head; and

a drive device which drives the movable body along the predetermined plane based on measurement information of the encoder system.

110. The movable body drive system according to claim 109 wherein

one of the scale and the head is placed on the movable body, and the other is placed faceable to the movable body.

111. The movable body drive system according to claim 110 wherein

the scale is placed on a surface of the movable body substantially parallel to the predetermined plane, and the head is placed outside of the movable body faceable to the scale.

112. The movable body drive system according to claim 111 wherein

the scale is placed on the surface of the movable body, with the first direction serving as a longitudinal direction,

the encoder system has a head unit including a plurality of the heads placed at positions of different detection points in the second axis direction, and

the plurality of the heads includes a head whose detection point in the second direction is set to a distance narrower than the width of the scale.

113. The movable body drive system according to claim 112 wherein

the scale is placed in a pair on the surface of the movable body apart in the second direction, and

the encoder system measures positional information of the movable body in directions of three degrees of freedom within the predetermined plane, based on an output of two heads of the head unit that simultaneously face the pair of scales.

114. The movable body drive system according to claim 113 wherein

the encoder system has a pair of the head units placed apart in the second direction, and also has at least one head faceable to the pair of scales, respectively.

115. The movable body drive system according to claim 110 wherein

the head is placed on the movable body, and the scale is placed faceable to the movable body.

116. The movable body drive system according to claim 115 wherein

the head is provided in a plurality, and is placed at different positions of the movable body in the first direction, and the scale is placed with the second direction serving as a longitudinal direction.

117. The movable body drive system according to claim 116 wherein

the heads are placed on both sides of the movable body in the second direction, at different positions in the first direction.

118. The movable body drive system according to claim 109 wherein

the drive device drives the movable body along the predetermined plane, based on measurement information of the encoder system and correction information corresponding to positional information of a direction different from the first and second directions of the movable body at the time of measurement by the encoder system.

119. The movable body drive system according to claim 118 wherein

the positional information of a direction different from the first and second directions of the movable body includes positional information related to at least one direction of a direction orthogonal to the predetermined plane of the movable body, a rotational direction in a surface parallel to the predetermined plane, a rotational direction around an axis parallel to the first direction, and a rotational direction around an axis parallel to the second direction.

120. The movable body drive system according to claim 109 wherein

the drive device drives the movable body, further based on characteristics information of the head used in measurement which becomes a generation factor of measurement errors of the encoder system.

121. The movable body drive system according to claim 120 wherein

the characteristics information includes optical properties of the head.

122. The movable body drive system according to claim 109 wherein

the drive device drives the movable body within the predetermined plane so as to compensate for measurement errors of the encoder system which occur due to the head used for measurement.

123. The movable body drive system according to claim 109 wherein

the drive device drives the movable body, further based on information related to the degree of flatness of the scale.

124. The movable body drive system according to claim 109 wherein

the drive device drives the movable body, further based on positional information of detection points of the heads used for measurement.

125. The movable body drive system according to claim 124 wherein

the drive device drives the movable body so as to compensate for measurement errors of the encoder system which occur due to the position or displacement of the detection points.

126. The movable body drive system according to claim 109 wherein

the drive device drives the movable body, further based on positional information related to a reference surface serving as a reference of a position in a third direction orthogonal to the predetermined plane of the movable body and positional information related to a grating surface of the scale in the third direction.

127. The movable body drive system according to claim 126 wherein

the drive device controls the position of the movable body so as to compensate for measurement errors of the encoder system which occur due to a difference of position of the reference surface and the grating surface in the third direction.

128. A pattern formation apparatus, comprising:

a movable body on which an object is mounted that can move substantially along a movement plane holding the object;

a patterning device which generates a pattern on the object; and

a movable body drive system according to claim 109 which drives the movable body for pattern formation to the object.

129. An exposure apparatus that forms a pattern on an object by an irradiation of an energy beam, the apparatus comprising:

a patterning device that irradiates the energy beam on the object; and

the movable body drive system according to claim 109, whereby the movable body drive system drives the movable body on which the object is mounted for relative movement of the energy beam and the object.

130. A device manufacturing method, including

exposing an object using the exposure apparatus according to claim 129;

and

developing the exposed object.

131. An exposure method in which an object is exposed with an energy beam, the method comprising:

holding the object with a movable body; and

driving the movable body with the movable body drive system according to claim 109, and exposing the object with the energy beam.

132. An exposure apparatus that exposes an object with an energy beam, the apparatus comprising:

a movable body which can hold the object and is also substantially movable along a predetermined plane;

a measurement device which has a measurement position where a measurement beam is irradiated placed away from an exposure position where the energy beam is irradiated in a first direction within the predetermined plane, and measures positional information of the object;

an encoder system in which a scale having a two-dimensional grating and whose longitudinal direction is in the first direction is placed on both sides of the movable body in a second direction orthogonal to the first direction within the predetermined plane, and a pair of head units having a plurality of heads whose positions in the second direction are different and at least one head faceable to each of the two scales is placed faceable to the movable body, and based on an output of two heads simultaneously facing the pair of scales, measures positional information of the movable body in directions of three degrees of freedom within the predetermined plane; and

a drive device which drives the movable body based on positional information of the movable body measured by the measurement device and positional information of the movable body measured by the encoder system.

133. The exposure apparatus according to claim 132, the apparatus comprising:

a liquid immersion member which can form a liquid immersion area in a space between an optical member through which the energy beam passes and the object; and

a moveable member which can move independently from the movable body, wherein

by placing the movable member on one side of the movable body in the first direction and moving the movable body and the movable member in the first direction, the liquid immersion area is moved between the movable body and the movable member while holding the liquid immersion area in the space with the optical member.

134. The exposure apparatus according to claim 133 wherein

the movable body is driven so that the liquid immersion area is not in contact with one of the scales and the head on the movable body, at the time when the liquid immersion area is moved between the movable body and the movable member.

135. The exposure apparatus according to claim 133 wherein

at the time of movement of the liquid immersion area, the movable body and the moveable member are in proximity or in contact in the first direction.

136. The exposure apparatus according to claim 133 wherein

the movable member includes at least one of a measurement stage which has a measurement member and another movable body which can move independently from the movable body and can hold an object.

137. The exposure apparatus according to claim 133 wherein

the moveable member is placed on a side opposite to the measurement unit with respect to the optical member in the first direction.

138. The exposure apparatus according to claim 132 wherein

the drive device drives the movable body, based on measurement information of the encoder system and correction information corresponding to positional information of the movable body in a direction different from the first and second directions at the time of measurement.

139. The exposure apparatus according to claim 132 wherein

the drive device drives the movable body, further based on at least one of characteristics information of the head and the scale which becomes a generation factor of measurement errors of the encoder system.

140. The exposure apparatus according to claim 139 wherein

the characteristics information includes information related to at least one of optical properties of the head, position of a detection point of the head, formation error of the two-dimensional grating, and degree of flatness of the scale.

141. The exposure apparatus according to claims 132 wherein

the drive device drives the movable body so as to compensate for measurement errors of the encoder system which occur due to at least one of the head and the scale.

142. A device manufacturing method, including

exposing an object using the exposure apparatus according to claim 132;

and

developing the exposed object.

143. An exposure apparatus that exposes an object with an energy beam, the apparatus comprising:

a movable body which can hold the object and is also substantially movable along a predetermined plane;

a measurement device which has a measurement position where a measurement beam is irradiated placed away from an exposure position where the energy beam is irradiated in a first direction within the predetermined plane, and measures positional information of the object;

an encoder system in which a pair of scales having a two-dimensional grating and whose longitudinal direction is in a second direction orthogonal to the first direction within the predetermined plane is placed faceable to the movable body, and a plurality of heads whose positions in the first direction are different and at least one head is faceable to each of the two scales are placed on both sides of the movable body, and based on an output of two heads simultaneously facing the pair of scales, measures positional information of the movable body in directions of three degrees of freedom within the predetermined plane; and

a drive device which drives the movable body based on positional information of the movable body measured by the measurement device and positional information of the movable body measured by the encoder system.

144. The exposure apparatus according to claim 143, the apparatus comprising:

a liquid immersion member which can form a liquid immersion area in a space between an optical member through which the energy beam passes and the object; and

a moveable member which can move independently from the movable body, wherein

by placing the movable member on one side of the movable body in the first direction and moving the movable body and the movable member in the first direction, the liquid immersion area is moved between the movable body and the movable member while holding the liquid immersion area in the space with the optical member.

145. The exposure apparatus according to claim 144 wherein

the movable body is driven so that the liquid immersion area is not in contact with one of the scales and the head on the movable body, at the time when the liquid immersion area is moved between the movable body and the movable member.

146. The exposure apparatus according to claim 144 wherein

at the time of movement of the liquid immersion area, the movable body and the moveable member are in proximity or in contact in the first direction.

147. The exposure apparatus according to claim 144 wherein

the movable member includes at least one of a measurement stage which has a measurement member and another movable body which can move independently from the movable body and can hold an object.

148. The exposure apparatus according to claim 144 wherein

the moveable member is placed on a side opposite to the measurement unit with respect to the optical member in the first direction.

149. The exposure apparatus according to claim 143 wherein

the drive device drives the movable body, based on measurement information of the encoder system and correction information corresponding to positional information of the movable body in a direction different from the first and second directions at the time of measurement.

150. The exposure apparatus according to claim 143 wherein

the drive device drives the movable body, further based on at least one of characteristics information of the head and the scale which becomes a generation factor of measurement errors of the encoder system.

151. The exposure apparatus according to claim 150 wherein

the characteristics information includes information related to at least one of optical properties of the head, position of a detection point of the head, formation error of the two-dimensional grating, and degree of flatness of the scale.

152. The exposure apparatus according to claim 143 wherein

the drive device drives the movable body so as to compensate for measurement errors of the encoder system which occur due to at least one of the head and the scale.

153. A device manufacturing method, including

exposing an object using the exposure apparatus according to claim 143;

and

developing the exposed object.

154. An exposure method in which an object is exposed with an exposure beam, the method comprising:

a process in which the object is mounted on a movable body which moves along a predetermined plane including a first axis and a second axis orthogonal to each other; and

a process in which at least a part of a periphery shot area of the object is exposed, using a periphery edge exposure system placed away in a direction parallel to the first axis from a measurement system, which is placed away in a direction parallel to the first axis direction within the predetermined plane from an exposure position where the exposure is performed as well as perform a predetermined measurement on the object, while a movable body on which the object is mounted is moved along a direction parallel to the first axis.

155. The exposure method according to claim 154 wherein

at least a part of an exposure operation by the periphery edge exposure system is performed in parallel with the measurement operation.

156. The exposure method according to claim 154 wherein

the predetermined measurement includes detecting a mark on the object using a mark detection system which has a plurality of detection areas whose positions are different in a direction parallel to the second axis.

157. The exposure method according to claim 154 wherein

the predetermined measurement includes detecting positional information of the object in a direction parallel to a third axis orthogonal to the predetermined plane in a detection area extending in a direction parallel to the second axis or at a plurality of detection points whose positions are different in a direction parallel to the second axis.

158. The exposure method according to claim 154 wherein

the periphery edge exposure system can simultaneously expose at least two places located apart in a direction parallel to the second axis of the object held by the movable body.

159. The exposure method according to claim 154 wherein

the periphery edge exposure system has a plurality of mirror elements placed in the shape of a matrix along a surface parallel to the predetermined plane, and can perform switching of a first state in which the energy beam incident on each mirror element is reflected to a predetermined direction and a second state in which the energy beam is reflected to a direction different from the predetermined direction.

160. The exposure method according to claim 154 wherein

shot areas in the periphery of the object exposed by the periphery edge exposure system is a shot area which has an area partially outside the effective area of the object.

161. A device manufacturing method, the method including:

exposing an object and forming a pattern by the exposure method according to claim 154; and

developing an object on which the pattern has been formed.

162. An exposure method in which an object is exposed with an exposure beam, the method comprising:

a process in which a movable body that is movable within a predetermined plane including a first axis and a second axis orthogonal to each other is made to hold an object; and

a process in which at least a part of an exposure operation of the periphery area is performed in parallel with a movement operation of the movable body from one of the exposure position and the exchange position to the other, using a periphery edge exposure system which is arranged between an exposure position where the exposure is performed and an exchange position of the object placed away from the exposure position in a direction parallel to the first axis, and exposes at least a part of a periphery area which is different from an area on the object where the exposure is performed.

163. The exposure method according to claim 162 wherein

at least a part of an exposure operation of the periphery area is performed in parallel with a measurement operation by a measurement system which is placed away from the exposure position in a direction parallel to the first axis, and measures positional information of the object.

164. The exposure method according to claim 163 wherein

the measurement system includes a mark detection system which has a plurality of detection areas whose positions are different in a direction parallel to the second axis.

165. The exposure method according to claim 162 wherein

the periphery edge exposure system has a plurality of irradiation areas whose positions are different in a direction parallel to the second axis and are each irradiated with an energy beam that can simultaneously expose different areas of the periphery areas.

166. The exposure method according to claim 162 wherein

as the movable body, a first and second movable bodies which respectively hold an object and are independently movable within the predetermined plane are provided, wherein

in parallel with an exposure operation of an object held by one of the first and second movable bodies, exposure of a periphery area of an object held by the other one of the first and second movable bodies is performed.

167. A device manufacturing method, the method including:

exposing an object and forming a pattern by the exposure method according to claim 162; and

developing an object on which the pattern has been formed.

168. An exposure method in which an object is exposed with an energy beam and a pattern is formed on the object, the method comprising:

a process in which exposure is performed on an object held by one of a first and second movable bodies which respectively hold an object and independently move within a predetermined plane including a first axis and a second axis orthogonal to each other, and in parallel, a plurality of marks on an object held by the other movable body of the first and second movable bodies are detected with a mark detection system which has a plurality of detection areas whose position is different in a direction parallel to the second axis and positional information of the marks measured, while the other object is driven in a direction parallel to the first axis.

169. A device manufacturing method, the method including:

exposing an object and forming a pattern by the exposure method according to claim 168; and

developing an object on which the pattern has been formed.

170. An exposure method in which an object is exposed with an energy beam and a pattern is formed on the object, the method comprising:

a process in which by controlling a planar motor which drives the first and second movable bodies respectively holding an object independently within a predetermined plane including a first axis and a second axis orthogonal to each other, the first movable body is moved along a first return path located on one side of an exposure position where the exposure is performed in a direction parallel to the second axis to a first exchange position where an object on the first movable body is exchanged when exposure of an object held by the first movable body has been completed, and the second movable body is also moved along a second return path located on the other side of the exposure position in a direction parallel to the second axis to a second exchange position where an object on the second movable body is exchanged when exposure of an object held by the second movable body has been completed.

171. The exposure method according to claim 170, the method further comprising:

a process in which the first and second movable bodies are controlled via the planar motor so that a switching is performed between a proximity state in which the first movable body and the second movable body are made to be in proximity in a direction parallel to the first axis by a predetermined distance or less and a separation state in which both movable bodies are separated, to pass a liquid immersion area, which is formed by a liquid being supplied in a space between an optical member emitting the energy beam and one of the first and second movable bodies, from the one movable body to the other movable body after exposure has been completed on an object held by the one movable body.

172. The exposure method according to claim 171 wherein

in the proximity state in which the first movable body and the second movable body are in proximity after exposure of an object held by the first movable body has been completed, the first movable body shifts to one side of the exposure position in a direction parallel to the second axis with respect to the second movable body, and

in the proximity state in which the first movable body and the second movable body are in proximity after exposure of an object held by the second movable body has been completed, the second movable body shifts to the other side of the exposure position in a direction parallel to the second axis with respect to the first movable body.

173. A device manufacturing method, the method including:

exposing an object and forming a pattern by the exposure method according to claim 170; and

developing an object on which the pattern has been formed.

174. An exposure method in which an object is exposed with an energy beam, the method comprising:

holding an object with a movable body which is substantially movable along a predetermined plane;

measuring positional information of the object on the movable body at a measurement position where a measurement beam is irradiated that is placed away from an exposure position where the energy beam is irradiated in a first direction within the predetermined plane;

measuring positional information of the movable body in directions of three degrees of freedom within the predetermined plane with an encoder system in which a pair of scales having a two-dimensional grating and whose longitudinal direction is in the first direction is placed on the movable body separately in a second direction orthogonal to the first direction within the predetermined plane, and a pair of head units having a plurality of heads whose positions in the second direction are different and at least one head faceable to each of the pair of scales is placed faceable to the movable body; and

driving the movable body based on positional information which has been measured and the measurement information of the encoder system and exposing the object with the energy beam.

175. The exposure method according to claim 174 wherein

exposure of the object is performed via a liquid immersion area formed in a space between an optical member through which the energy beam passes and the object, and by placing a movable member on one side of the movable body in the first direction and moving the movable body and the movable member in the first direction, the liquid immersion area is moved between the movable body and the movable member while holding the liquid immersion area in the space with the optical member.

176. The exposure method according to claim 175 wherein

the movable body is driven so that the liquid immersion area is not in contact with one of the scales and the head on the movable body, at the time when the liquid immersion area is moved between the movable body and the movable member.

177. The exposure method according to claim 175 wherein

at the time of movement of the liquid immersion area, the movable body and the moveable member are in proximity or in contact in the first direction.

178. The exposure method according to claim 174 wherein

the moveable member is placed on a side opposite to the measurement unit with respect to the optical member in the first direction.

179. The exposure method according to claim 174 wherein

the movable body is driven, based on measurement information of the encoder system and correction information corresponding to positional information of the movable body in a direction different from the first and second directions at the time of measurement.

180. The exposure method according to claim 174 wherein

the movable body is driven, further based on at least one of characteristics information of the head and the scale which becomes a generation factor of measurement errors of the encoder system.

181. The exposure method according to claim 180 wherein

the characteristics information includes information related to at least one of optical properties of the head, position of a detection point of the head, formation error of the two-dimensional grating, and degree of flatness of the scale.

182. The exposure method according to claim 174 wherein

the movable body is driven so as to compensate for measurement errors of the encoder system which occur due to at least one of the head and the scale.

183. A device manufacturing method, the method including:

exposing an object and forming a pattern by the exposure method according to claim 174; and

developing an object on which the pattern has been formed.

184. An exposure method in which an object is exposed with an energy beam, the method comprising:

holding an object with a movable body which is substantially movable along a predetermined plane;

measuring positional information of the object on the movable body at a measurement position where a measurement beam is irradiated that is placed away from an exposure position where the energy beam is irradiated in a first direction within the predetermined plane;

measuring positional information of the movable body in directions of three degrees of freedom within the predetermined plane, with an encoder system in which a pair of scales having a two-dimensional grating and whose longitudinal direction is in a second direction orthogonal to the first direction within the predetermined plane is placed faceable to the movable body, and a plurality of heads whose positions in the first direction are different and at least one head is faceable to the pair of scales are placed on both sides of the movable body; and

driving the movable body based on positional information which has been measured and the measurement information of the encoder system and exposing the object with the energy beam.

185. The exposure method according to claim 184 wherein

exposure of the object is performed via a liquid immersion area formed in a space between an optical member through which the energy beam passes and the object, and

by placing a movable member on one side of the movable body in the first direction and moving the movable body and the movable member in the first direction, the liquid immersion area is moved between the movable body and the movable member while holding the liquid immersion area in the space with the optical member.

186. The exposure method according to claim 185 wherein

the movable body is driven so that the liquid immersion area is not in contact with one of the scales and the head on the movable body, at the time when the liquid immersion area is moved between the movable body and the movable member.

187. The exposure method according to claim 185 wherein

at the time of movement of the liquid immersion area, the movable body and the moveable member are in proximity or in contact in the first direction.

188. The exposure method according to claim 184 wherein

the moveable member is placed on a side opposite to the measurement unit with respect to the optical member in the first direction.

189. The exposure method according to claim 184 wherein

the movable body is driven, based on measurement information of the encoder system and correction information corresponding to positional information of the movable body in a direction different from the first and second directions at the time of measurement.

190. The exposure method according to claim 184 wherein

the movable body is driven, further based on at least one of characteristics information of the head and the scale which becomes a generation factor of measurement errors of the encoder system.

191. The exposure method according to claim 190 wherein

the characteristics information includes information related to at least one of optical properties of the head, position of a detection point of the head, formation error of the two-dimensional grating, and degree of flatness of the scale.

192. The exposure method according to claim 184 wherein

the movable body is driven so as to compensate for measurement errors of the encoder system which occur due to at least one of the head and the scale.

193. A device manufacturing method, the method including:

exposing an object and forming a pattern by the exposure method according to claim 184; and

developing an object on which the pattern has been formed.